Evaporation and sputter technique (PVD-Laboratory)

In the PVD (physical vapour deposition) laboratory thin film systems are deposited with the following techniques:

• Magnetron sputtering (optional: reactive, Kodeposition, bias operation, plasma excitation: DC, HF, asymetric pulse)
• electron beam evaporation
• resistor heated evaporation

The focus of the laboratory is on the following silicon thin film solar cell related topics:

• Ion assisted deposition of Si layer systems
• Si thin film solar cells with heterojunctions
• Contact systems

The following in situ diagnosis methods are available:

• Optical emission spectrometer
• Langmuir probe
• Residual gas mass spectrometer

The cluster tool consists of a sputter deposition chamber with 4 stations and an electron beam evaporation chamber. The stations are configured as follows:

• Triple source arrangement
• Two sputter sources
• Kaufmann ion source

Investigated materials and material groups:

• Silicon
• Transparent conducting oxides (TCO)
• Buffer layers
• Metal contacts