Wet chemical conditioning of semiconductor interfaces

A vast part of the silicon applications for solar cell and other industrial technologies is based on interface properties. Motivated by the higher integration and miniaturization of microelectronic devices, much work is dedicated to the development of preparation techniques of thin film structures with small defect and contamination densities.

Important preconditions for the economically attractive development of solar cells are the preparation of appropriate interfaces, their passivation, and material reduction through the use of thin film technologies.

Since interface properties are of much greater importance for thin film structures than for conventional device concepts, the technological controllability of morphological, chemical and electronical interface properties by means of wet chemical treatment is the focus of our work.