Publications 2011
Schulz, J.; Lemke, S.; Mohr, J.; Voigt, A.; Walter, M.; Worgull, M.:
LIGA - Neues von Tiefenlithographie und Abformung. In: Proceedings / Mikrosystemtechnik-Kongress 2011 : 10. - 12. Oktober 2011, Darmstadt. 1 CD-ROM. Berlin: VDE-Verl., 2011. - ISBN 978-3-8007-3367-5, p. 142-145
Barber, S.K.; Geckeler, R.D.; Yashchuk, V.V.; Gubarev, M.V.; Buchheim, J.; Siewert, F.; Zeschke, T.:
Optimal alignment of mirror-based pentaprisms for scanning deflectometric devices. Optical Engineering 50 (2011), p. 073602/1-8
Barber, S.K.; Morrison, G.Y.; Yashchuk, V.V.; Gubarev, M.V.; Geckeler, R.D.; Buchheim, J.; Siewert, F.; Zeschke, T.:
Developmental long-trace profiler using optimally aligned mirror-based pentaprism. Optical Engineering 50 (2011), p. 053601/1-10
Bischoff, J.; Senn, T.; Löchel, B.:
Prozessoptimierung zur Herstellung von zweidimensionalen photonischen Kristallen mittels Nanoimprint Lithografie. In: Mikro-Nano-Integration : Beiträge des 3. GMM-Workshops, 3. - 4. März 2011 in Stuttgart. 1 CD-ROM. Berlin: VDE-Verl., 2011. - ISBN 978-3-8007-3334-7, p. 68-72
Brenner, G.; Kapitzki, S.; Kuhlmann, M.; Ploenjes, E.; Noll, T.; Siewert, F.; Treusch, R.; Tiedtke, K.; Reininger, R.; Roper, M.D.; Bowler, M.A.; Quinn, F.M.; Feldhaus, J.:
First results from the online variable line spacing grating spectrometer at FLASH. Nuclear Instruments and Methods in Physics Research A 635 (2011), p. S99-S103
Dietsch, R.; Rack, A.; Weitkamp, T.; Riotte, W.; Rack, T.; Holz, T.; Krämer, M.; Weissbach, D.; Morawe, Ch.; Siewert, F.; Meduna, M.; Cloetens, P., Ziegler E.:
Performance of Multilayer Monochromators for Hard X-Ray Imaging with Coherent Synchrotron Radiation. In: McNulty, I. [u.a.] [Eds.] : The 10th International Conference on X-Ray Microscopy. Woodbury, NY: AIP Press, 2011 (AIP Conference Proceedings ; 1365). - ISBN 978-0-7354-0925-5, p. 77-80
Döring, S.; Schönbohm, F.; Berges, U.; Schreiber, R.; Bürgler, D.E.; Schneider, C.M.; Gorgoi, M.; Schäfers, F.; Papp, C.; Balke, B.; Fadley, C.S.; Westphal, C.:
Hard x-ray photoemission studies using standing-wave excitation applied to the MgO/Fe interface. Physical Review B 83 (2011), p. 165444/1-9
Faatz, B.; Baboi, N.; Ayvazyan, V.; Balandin, V.; Decking, W.; Duesterer, S.; Eckoldt, H.J.; Feldhaus, J.; Golubeva, N.; Honkavaara, K....... Bahrdt, J.; Follath, R.; Gensch, M.; Holldack, K.; Meseck, A.; Mitzner, R...:
FLASH II: Perspectives and challenges. Nuclear Instruments and Methods in Physics Research A 635 (2011), p. S2-S5
Fauquet C.; Dehlinger, M.; Jandard, F.; Ferrero, S.; Pailharey, D.; Larcheri, S.; Graziola, R.; Purans, J.; Bjeoumikhov, A.; Erko, A.; Zizak, I.; Dahmani, B.; Tonneau, D.:
Combining scanning probe microscopy and x-ray spectroscopy. NANOSCALE RESEARCH LETTERS 6 (2011), p. 308/1-6
Grigorian, S.; Tranchida, D.; Ksenzov, D.; Schäfers, F.; Schönherr, H.; Pietsch, U.:
Structural and morphological changes of P3HT films in the planar geometry of an OFET device under an applied electric field. European Polymer Journal 47 (2011), p. 2189-2196
Kordyuk, A.A.; Zabolotnyy, V.B.; Evtushinsky, D.V.; Kim, T.K.; Morozov, I.V.; Kulic, M.L.; Follath, R.; Behr, G.; Büchner, B.; Borisenko, S.V.:
Angle-resolved photoemission spectroscopy of superconducting LiFeAs: Evidence for strong electron-phonon coupling. Physical Review B 83 (2011), p. 134513/1-6
Krempaský, J.; Follath, R.; Strocov, V.N.; Schmitt, T.; Flechsig, U.:
Heydemann interpolation correction for energy linearization of soft X-ray monochromators. In: Morawe, C. [u.a.] [Eds.] : Advances in x-ray/EUV optics and components VI : 22 - 24 August 2011, San Diego, California, United States. Bellingham, Wash.: SPIE, 2011 (Proceedings of SPIE ; 8139). - ISBN 978-0-8194-8749-0, p. 81390K/1-5
Ksenzov, D.; Schlemper, Ch.; Davtyan, A.; Bajt, S.; Schäfers, F.; Pietsch, U.:
A setup for probing ultra-short soft X-ray diffraction by means of curved multilayer structures. Nuclear Instruments and Methods in Physics Research B 269 (2011), p. 2124-2129
Rehanek, J.; Schäfers, F.; Scheer, M.; Erko, A.; Scheer, M.; Freund, W.; Grünert, J.; Ozkan, C.; Molodtsov, S.:
Simulations of diagnostic spectrometers for the European XFEL using the ray-trace tool RAY. In: Sanchez del Rio, M. [u.a.] [Eds.] : Advances in computational methods for X-ray optics II : 21 - 24 August 2011, San Diego, California, United States. Bellingham, Wash.: SPIE, 2011 (Proceedings of SPIE ; 8141). - ISBN 978-0-8194-8751-3, p. 814109/1-15
Schoengen, M.; Nüsse, N.; Probst, J. Kronast, F.; Barth, M.; Wolters, J.; Löchel, B.; Benson, O.:
Einbettung von plasmonischen Elementen in photonische Kristall-Resonatoren für Licht-Materiekopplung. In: Proceedings / Mikrosystemtechnik-Kongress 2011 : 10. - 12. Oktober 2011, Darmstadt. 1 CD-ROM. Berlin: VDE-Verl., 2011. - ISBN 978-3-8007-3367-5, p. 102-105
Schönfeld, M.; Saupe, J.; Vogel, J.; Aßmann, H.; Cappek, M.; Lemke, S.; Löchel, B.; Grimm, J.:
Experimentelle Untersuchung und theoretische Betrachtung zur gravimetrisch kontrollierten IR-Trocknung dicker SU-8-Schichten. In: Proceedings / Mikrosystemtechnik-Kongress 2011 : 10. - 12. Oktober 2011, Darmstadt.
1 CD-ROM. Berlin: VDE-Verl., 2011. - ISBN 978-3-8007-3367-5, p. 543-546
Senn, T.; Bischoff, J.; Nüsse, N.; Schoengen, M.; Löchel, B.:
Fabrication of photonic crystals for applications in the visible range by Nanoimprint Lithography. Photonics and Nanostructures - Fundamentals and Applications 9 (2011), p. 248-254
Senn, T.; Esquivel, J.P.; Sabaté, N.; Löchel, B.:
Fabrication of high aspect ratio nanostructures on 3D surfaces. Microelectronic Engineering 88 (2011), p. 3043-3048
Senn, T.; Kutz, O.; Weniger, Ch.; Li, J.; Schoengen, M.; Löchel, H.; Wolf, J.; Göttert, P.; Löchel, B.:
Integration of moth-eye structures into a poly(dimethylsiloxane) stamp for the replication of functionalized microlenses using UV-nanoimprint lithography. Journal of Vacuum Science and Technology B 29 (2011), p. 061601/1-5
Siewert, F.; Buchheim, J.; Zeschke, T.; Brenner, G.; Kapitzki, S.; Tiedtke, K.:
Sub-nm accuracy metrology for ultra-precise reflective X-ray optics. Nuclear Instruments and Methods in Physics Research A 635 (2011), p. S52-S57
Störmer, M.; Siewert, F.; Gaudin, J.:
Development of x-ray optics for advanced research light sources. In: Tschentscher. T. [u.a.] [Eds.] : Advances in x-ray free-electron lasers: radiation schemes, x-ray optics, and instrumentation : 20 - 21 April 2011, Prague, Czech Republic. Bellingham, Wash.: SPIE, 2011 (Proceedings of SPIE ; 8078). - ISBN 978-0-8194-8668-4, p. 80780G/1-8
Svarcova, S.; Bezdicka, P.; Hradil, D.; Hradilova, J.; Zizak, I.:
Clay pigment structure characterisation as a guide for provenance determination - a comparison between laboratory powder micro-XRD and synchrotron radiation XRD. Analytical and Bioanalytical Chemistry 399 (2011), p. 331-336
doi:10.1007/s00216-010-4382-4
Tavella, F.; Adams, D.; Ayvazyan, V.; ..Bahrdt, J.; ..Follath, R.; Gensch, M.;..Holldack, K.;...Meseck, A.;...Mitzner, R; ...:
High Repetition Rate mJ-level Few-Cycle Pulse Laser Amplifier for XUV-FEL seeding. In: High Intensity Lasers and High Field Phenomena (HILAS), Istanbul, Turkey. February 16, 2011. , 2011, p. [1-3]
Thirupathaiah, S.; Rienks, E.D.L.; Jeevan, H.S.; Ovsyannikov, R.; Slooten, E.; Kaas, J.; van Heumen, E.; de Jong, S.; Dürr, H.A.; Siemensmeyer, K.; Follath, R.; Gegenwart, P.; Golden M.S.; Fink, J.:
Dissimilarities between the electronic structure of chemically doped and chemically pressurized iron pnictides from an angle-resolved photoemission spectroscopy study. Physical Review B 84 (2011), p. 014531/1-7
Wang, C.; Neugebauer, U.; Bürck, J.; Myllykoski, M.; Baumgaertel, P.; Popp, J.; Kursula, P.:
Charge Isomers of Myelin Basic Protein: Structure and Interactions with Membranes, Nucleotide Analogues, and Calmodulin. PLoS ONE 6 (2011), p. e19915/1-15
Wiegmann, A.; Stavridis, M.; Walzel, M.; Siewert, F.; Zeschke, T.; Schulz, M.; Elster, C.:
Accuracy evaluation for sub-aperture interferometry measurements of a synchrotron mirror using virtual experiments. Precision Engineering 35 (2011), p. 183-190
Yashchuk, V.V.; Takacs, P.Z.; McKinney, W.R.; Assoufid, L.; Siewert, F.; Zeschke, T.:
Development of a new generation of optical slope measuring profiler. Nuclear Instruments and Methods in Physics Research A 649 (2011), p. 153-155
