A major feature of the SISSY-Lab is the direct connection of a large variety of deposition instruments to the analysis stations SISSY-1 and SISSY-nonSR via a fully automatized UHV-transfer backbone. By this arrangement deposition sequences can by analysed step by step in-system. With special precautions regarding cross-contaminations even combinations of different material classes can be produced and analysed.
The deposition instruments installed and planned are
- Thin film Silicon Cluster
- Thermoelectric Sputtertool
- Metaloxide Pulsed Laser Deposition
- UHV- organic and anorganic preparation chambers
- Glovebox preparation