Many established microsystems technology processes are applied in the manufacturing of gratings.
The substrates are spin-coated with photo resist and then dried.
After exposure e. g. to UV light, the grating structure is uncovered in one development step.
After microscopic examination, the resist structure is copied into a metal structure.
The next step is to perform a wet-chemical transfer of the grating structure to the substrate.
Surface cleaning with oxygen plasma
Since outstanding planarity and entire particle freedom of the surfaces are of vital importance, special cleaning methods are required, like e. g. the ashing of organic materials on the surfaces via oxygen plasma. Here, too, we have a special machine equiped with a plasma chamber for this purpose.