Laserline Source for the Material Finishing and Silicon-on-Glas Technology (SP 3)

The recent progress in the field of high power diode lasers and LED illumination lead to novel beam sources that combine high power densities, excellent conversion efficiencies with flexible beam geometries and wavelengths. The focus of this project is the evaluation of these sources for applications in the field of PV, display technology or sensors and to contribute to the further development of these sources. The established deposition technology at HZB enables for example a direct crystallization of silicon on glass without the need for time and energy consuming dehydrogenation processes. The increasing availability of diode laser sources emitting a short wavelength (450nm) enables tailored annealing processes or crystallization of ultra-thin silicon layers for thin-film microelectronics or transparent conductive oxides (TCOs).