Publikationen 2018

Dziarzhytski, S.; Siewert, F.; Sokolov, A.; Gwalt, G.; Seliger, T.; Rübhausen, M.; Weigelt, H.; Brenner, G.: Diffraction gratings metrology and ray-tracing results for an XUV Raman spectrometer at FLASH. Journal of Synchrotron Radiation 25 (2018), p. 138-144
Open Access Version

Guttmann, P.; Werner, S.; Siewert, F.; Sokolov, A.; Schmidt, J.-S.; Mast, M.; Brzhezinskaya, M.; Jung, C.; Follath, R.; Schneider, G.: The New HZB X-Ray Microscopy Beamline U41-PGM1-XM at BESSY II. Microscopy and Microanalysis 24 (2018), p. 204-205
Open Access Version

Majhi, A.; Nayak, M.; Pradhan, P.C.; Filatova, E.O.; Sokolov, A.; Schäfers, F.: Soft X-ray Reflection Spectroscopy for Nano-Scaled Layered Structure Materials. Scientific Reports 8 (2018), p. 15724/1-9
Open Access Version

Mertins, H.-Ch.; Jansing, C.; Krivenkov, M.; Varykhalov, A.; Rader, O.; Wahab, H.; Timmers, H.; Gaupp, A.; Sokolov, A.; Tesch, M.; Oppeneer, P. M.: Giant magneto-optical Faraday effect of graphene on Co in the soft x-ray range. Physical Review B 98 (2018), p. 064408/1-9

Pietzsch, A.; Sokolov, A.; Blume, T.; Neppl, S.; Senf, F.; Siewert, F.; Föhlisch, A.: Inverted VLS Spectrometer at BESSY for Molecular Potential Energy Surfaces and Excitations. Synchrotron Radiation News 31 (2018), p. 20-25
Open Access Version

Siewert, F.; Löchel, B.; Buchheim, J.; Eggenstein, F.; Firsov, A.; Gwalt, G.; Kutz, O.; Lemke, S.; Nelles, B.; Rudolph, I.; Schäfers, F.; Seliger, T.; Senf, F.; Sokolov, A.; Waberski, C.; Wolf, J.; Zeschke, T.; Zizak, I.; Follath, R.; Arnold, T.; Frost, F.; Pietag, F.; Erko, A.: Gratings for synchrotron and FEL beamlines: a project for the manufacture of ultra-precise gratings at Helmholtz Zentrum Berlin. Journal of Synchrotron Radiation 25 (2018), p. 91-99
Open Access Version

Sokolov, A.; Sertsu, M.; Gaupp, A.; Lüttecke, M.; Schäfers, F.: Efficient high-order suppression system for a metrology beamline. Journal of Synchrotron Radiation 25 (2018), p. 100-107
Open Access Version

Svechnikov, M.V.; Chkhalo, N.I.; Gusev, S.A.; Nechay, A.N.; Pariev, D.E.; Pestov, A.E.; Polkovnikov, V.N.; Tatarskiy, D.A.; Salashchenko, N.N.; Schäfers, F.; Sertsu, M.G.; Sokolov, A.; Vainer, Y.A.; Zorina, M.V.: Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography. Optics Express 26 (2018), p. 33718-33731
Open Access Version