SPEEM
Photoemission Electron Microscope at UE49-PGM
SPEEM is designed for studying sub-100nm scale magnetoelectronic devices by combining a photoemission electron microscope (PEEM) with a dedicated microfocus beamline offering full x-ray polarization control. The synergy between the microscopy capabilities of the PEEM and the polarization control of synchrotron radiation makes X-PEEM the ideal tool for spatially resolved and element selective investigation of nanostructures by means of chemical maps (XAS) and magnetic imaging (XMCD and XLD).
Anwendungsbeispiele:- Micro-spectroscopy and Spectro-microscopy
- Observation of laser induced magnetization switching in space and time
- Imaging of chemical profiles and spin textures in 2d and 3d nano-structures
- Direct observation of phase transitions or magnetic responses
- Momentum-resolved studies of 2d-materials using k-space microscopy
Methods
XMLD, XMCD, Time-resolved studies, X-ray Microscopy, Photoelectron EM, XPS
Remote access
not possible
| Beamline data | |
|---|---|
| Energy range | 100 - 1800 eV |
| Energy resolution | 10000 at 700 eV |
| Flux | 1011 - 1013 |
| Polarisation | variable |
| Focus size (hor. x vert.) | 20 μm X 10 μm at sample position |
| Phone | +49 30 8062 14750 |
| Weitere Details | UE49_PGM SPEEM |
| Station data | |
| Temperature range | 45 - 600 K |
| Pressure range | 10-11 - 10-9 mbar |
| Detector | TimePix3 time-resolution 1.6ns |
| Manipulators | PEEM manipulator with azimuth rotation |
| Sample holder compatibility | • Sample size: 2mm x 2mm to 20mm x 20mm
• Simultaneous temperature, magnetic and electric field control |
| Additional equipment | • Ti:Sapphire laser
• Magnetic field: holders for in- and out of plane magnetic fields up to 1000 Oe • Electric field: up to 200 V out of plane • Evaporation of Fe, Co, Ni, Al • Sputtering with Ar or O Sample storage in vacuum: up to 6 |
Magnetic nanostructures are at the heart of modern data storage technology. Typical dimensions of magnetic bits are in the sub-100nm region. In addition novel magnetoelectronics devices such as magnetic random access memory junctions are operated on the sub-100nm m scale. An understanding magnetic properties of such low-dimensional structures is only accessible to spectro-microscopy tools capable of appropriate lateral resolution. This goal is achieved by combining a novel spin-resolved photoemission microscope (SPEEM) with a dedicated microfocus PGM beamline with full x-ray polarization control (UE49-PGM SPEEM).
The synergy between the microscopy capabilities of the PEEM and the polarization control of synchrotron radiation makes of X-PEEM the ideal tool for space resolved and element selective investigation of nanostructures by means of chemical maps (XAS) and magnetic imaging (XMCD and XLD).
For a detailed description of the experimental station as well as for an overview of the experimental possibilities of our microscope, please visit the following link XPEEM to get more information about sample holders and sample environment, possibilities for in-situ sample preparation and time-resolved experiments.