The sputtering lab is equipped with a magnetron sputtering system named MAGGSY. Various materials are available to be use by the HZB users for thin film deposition and for sample coating. The parameters of the system are summarized below:
Typical base pressure: 2x10^(-8) mbar
Partial Ar pressure: 1.5x10^(-3) mbar
Materials: metals, oxides
Substrates: Si, oxides
Deposition rates: ~0.01-0.1 nm/s
Typical layer thicknesses: 0.1-10 nm
The sample characterization in the sputtering lab is temporarly limited, but possible in the other available HZB user labs. For scheduling you sample growth, please contact the lab responsible at least 5 months in advance of your experiments.