The BAMline is specialized for nondestructive material characterization using different methods. The main applications of the monochromatic radiation with photon energies up to 60 keV are x-ray fluorescence analysis, micro computed tomography, x-ray topography, detector calibration and reflectometry. Calculable undispersed radiation up to 200 keV is available for radiometric applications. Depending on the requirements the used beam size varies between 1.5µm and 10mm.
|Pressure range||Check text below. For more details contact the Instrument Scientist.|
|Source||7T-WLS-1 (Wavelength Shifter, critical energy 13.5 keV at 1.7 GeV electron energy)|
|Monochromator||Double Multilayer Monochromator (DMM) and/or Double Crystal Monochromator (DCM)|
|Energy range||8 keV - 60 keV|
|Energy resolution||DCM: ~0.01%, DMM: ~1.5%, ~4%, pink beam|
|Flux||DMM: 8.0E+10 @20 keV, 4.0E+10 @40 keV; DCM (Si111): 5.5E+8 @14 keV, 3.5E+8 @30 keV; units: s^-1 x mm^-2|
|Divergence horizontal||5 mrad|
|Divergence vertical||1 mrad|
|Focus size (hor. x vert.)||DMM: vert. 0.15 mm between 35 m and 45 m from source; DCM: hor. 0.25 mm at 37 m from source|
|User endstation||contact the Instrument Scientist|
|Distance Focus/last valve||1000 - 10000 mm|
|Height Focus/floor level||1400-1465 mm|
|Phone||+49 30 8104 5576|
The first hard x-ray beamline at BESSY II has been installed by BAM and PTB at a superconducting 7 T wavelength shifter. The main optical elements of the beamline are a double-multilayer monochromator and a double-crystal monochromator. Depending on the application, the two devices are used separately or in-line. The main applications of the monochromatic radiation with photon energies up to 60 keV are x-ray fluorescence analysis, micro computed tomography, x-ray topography, detector calibration and reflectometry. Calculable undispersed radiation up to 200 keV is available for radiometric applications.
The BAMline is specialized for nondestructive material characterization using different methods. Depending on the requirements the used beam size varies between 1.5 and 10000µm.
Following methods are available:
1) μ-XRF mapping in scanning mode.
Resolution depends on the used optics and can be selected between 1.5 and 200µm. Primary beam energy range is 5keV-65keV.
2) μ-XRF mapping with color x-ray camera CXC.
Fast one shot imaging with resolution between 10 and 50µm. Primary beam energy range is 5keV-35keV.
3) 3D XRF-Mapping.
In slicing, or x-ray sheet microscopy, the excitation of the sample is realized with a thin sheet-beam and the detection with the CXC. The stepwise movement of the sample allows getting the element distribution for each layer with one measurement. These layers can be combined to a full 3D data set for each element afterwards. Since the information is collected layer per layer, there is no need to apply reconstruction techniques, which can be the reason for artifacts in the results.
4) EXAFS and XANES. The acquisition of the energy-dependent absorption spectra on selected position at the sample is possible in fluorescence and absorption mode. Time resolved experiments are possible down to second range.
5) Computed Tomography (SXCT) can be performed using a DMM with W/Si layers in monochromatic mode (~3.5% dE/E, typically between 8 and 60 keV) or with a single Pd-layer in pink beam mode. It can be chosen to do stepping scans or on-the-fly scans for faster acquisition times (sCMOS-camera). A set of four lenses and thus field of views can be chosen to adapt to different sized samples.
Lens field of view pixel size
2x 9.2 x 7.8 mm, 3.6 µm
5x 3.7 x 3.1 mm, 1.44 µm
10x 1.8 x 1.5 mm, 0.72 µm
20x 0.92 x 0.78 mm, 0.36 µm
The Rotation stage (Micos UPR160A) is equipped with a XY piezo stage for sample positioning as well as an electric slip ring feeding 8 channels (up to 1A each) through the stage onto the rotating top. Alternatively, a Huber 410 rotation stage is available for larger loads.
6) X-ray refraction radiography (SXRR) and tomography (SXRCT) is performed with the DCM (with Si(111) crystals, dE/E = ~0.2%, typically between 8 and 50 keV). For radiation divergence analysis, a Si(111) crystal is used between the sample and the detector system. The nominal pixel size is 4 µm x 4 µm. The field of view is approximately 7 mm (hor.) x 6 mm (ver.) @ 20 keV.
A turntable (Micos UPR160A) with an XY piezo stage is available for sample positioning.
For larger loads, a Huber 410 turntable can be used as an alternative. The turntable can be moved with x, y, z linear stages.
7) Optical microscope is available for alignment purposes. The microscopy images can be saved at every measurement coordinate, so that the correlation between the measured data and the microscopy is rather simple.
Different scanning environments for different sample sizes (from several micrometer to 150mm) are available at the beamline. Rotational units are available as well.
There is no vacuum environment available at the beamline, but it is possible to mount sample environments or reactors in the experimental hutch.
Temperature in experimental hutch is controlled.
For details and current status contact the beamline scientist(s).