UE112_PGM-1
XUV undulator radiation variable polarization with PGM for meV RIXS + open port
The low-energy high-flux beamline UE112_PGM-1 with permanent meV RIXS experiment and open port for flexible end stations
Applicable station(s)
| Temperature range | Pressure Range | |
|---|---|---|
| RGBL-PEEM | ||
| SolidFlexRIXS | 20-1500K | 10-8 mbar |
| meV RIXS | -- | |
| nmTransmission NEXAFS | room temperature | <10^-3 mbar |
| Resonant Scattering | low-temperature sample holder 6.5 - 300 K, high temperature sample holder 80 - 650 K | 5 x 10-8 mbar (regular), < 2 x 10-9 mbar (after bakeout) |
| ALICE | 10 K-475K | -- |
| Beamline data | |
|---|---|
| Segment | H13 |
| Location (Pillar) | 15.1 |
| Source | UE112 (Elliptical Undulator) |
| Monochromator | PGM with 3 gratings (300 l/mm, 600 l/mm and 1400 l/mm) |
| Energy range | 8 - 690 eV; for extreme values (<50 eV or >400 eV) contact the beamline crew |
| Energy resolution | 30,000 (20-150eV) > 20,000 (150-350eV) (standard grating) |
| Flux | > 2x1012 ph/s (20-280eV) ca. 4x1013 ph/s (50-150eV) (standard grating) |
| Polarisation | variable |
| Divergence horizontal | 1.4 @ 63.5eV mrad |
| Divergence vertical | 0.6 @ 63.5eV mrad |
| Focus size (hor. x vert.) | optimum: ca. 0.08 x 0.08 mm (without halo) |
| User endstation | possible |
| Distance Focus/last valve | ca. 1068 (dist. from the CF40 centering flange ca. 1003) mm |
| Height Focus/floor level | ca. 1396.5 (1393 mm at refocus-chamber exit) mm |
| Beam availability | 12h/d |
| Phone | +49 30 8062 14836 |
| Polyimid foil (150 nm thick) | Suppression at about 10 to 80 eV (foil installed) |
| Al foil (150 nm thick) | Suppression at E > 73 eV (and < 15 eV) (foil installed) |
| Mg foil (240 nm thick) | Suppression at E > 50 eV (and < 11 eV) (foil installed) |
| low-energy suppression | Suppression of photon energies slightly above 21 eV, requires user installation of absorption foils. Materials such as Europium (Eu) or Neodymium (Nd) are suggested for this case. |
For further information about the ID see:
Bahrdt et al., “Compensation of Beam Line Polarizing Effects at UE112 of BESSY II,” 2010, pp. 335–338. DOI: 10.1063/1.3463205
For information about the Monochromator consult:
R. Follath and F. Senf, “New plane-grating monochromators for third generation synchrotron radiation light sources,” Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, vol. 390, no. 3, pp. 388–394, May 1997. DOI: 10.1016/S0168-9002(97)00401-4
Other beamline related literature:
R. Follath, F. Senf, and W. Gudat, “Plane-grating monochromator at BESSY II using collimated light,” Journal of Synchrotron Radiation, vol. 5, no. 3, pp. 769–771, May 1998. DOI: 10.1107/S090904959800079X