Combined Low-Energy- / Photoemission-Electron-Microscope with aberration correction.
For more details, please contact Stefan Cramm "s.cramm (at) fz-juelich.de".
Assigned to beamline(s)
|UE56-1_SGM||55 - 1500 eV||• horizontal|
|Temperature range||300-1600 K|
|Pressure Range||4 E-10 -- 1 E-7 mbar|
|Detector||two-stage MCP (Hamamatsu)|
|Sample holder compatibility||special SPECS
|Spatial resolution LEEM-mode||2 nm|
|Spatial resolution PEEM-mode||20 nm|
|base pressure||4E-10 mbar|
|Preparation chamber||* Sputtering up to 1.5kV * Sample temp. range 300 - 1200 K * pyrometric temp. measurement * LEED * Auger * gas inlets: Ar, O2, user specific * base pressure 1E-10 mbar|
|phone||+49 30 8062 14714|
This microscope is equipped with a new state-of-the-art aberration corrector minimizing electron-optical imperfections, allowing for higher instrument transmission and simultaneously better spatial resolution. In LEEM-Mode, 2 nm have been demonstrated recently. In combination with soft x-rays (XPEEM), spatially-resolved spectroscopic investigations can be carried out (NEXAFS, XPS) as well as magnetic spectroscopies (XMCD,XMLD). A recently installed extension allows to perform stroboscopic XPEEM experiments for magnetization dynamics.