Small Reflectometer

Small Reflectometer

The reflectometer is a multipurpose instrument to determine the optical properties of samples in transmission or reflection. The reflectivity can be determined at a fixed photon energy as function of the incidence angle or vice versa as function of the energy for a certain incidence angle. The samples can have a size from a few square millimeters to macroscopic optical elements, thus performance measurements on realistic beamline optical components like mirrors, gratings or crystals are possible as well as the investigation of e.g. multilayer samples on Si-wafer substrates.

Selected Applications:
  • at-wavelength metrology on EUV/XUV/tender-X-ray optics (diffraction gratings, ML or single coated mirrors, filters and etc.)
  • Extreme Ultraviolet/Soft X-ray/XUV/Tender-X-ray reflectometry (SXR, XRR)


Methods

Reflectivity, NEXAFS, Reflectometry

Remote access

depends on experiment - please discuss with Instrument Scientist

Station data
Temperature range room temperature
Pressure range For details contact the station manager
Detector GaAs-photodiodes, Channeltron
Manipulators 3 independent goniometers for sample (incidence angle theta), detector in-plane (twotheta) and off-plane (detector) scans, off-plane linear sample translation for sample positioning (sample_x)
Sample holder compatibility For details contact the station manager
Additional equipment
Max. sample size 150 x 40 x 35 (L x W x H) mm
Min. sample size 5 x 5 x 0.5 (L x W x H) mm
Sample scan range -90 to +90 degree
Min. angle to normal 2.0 degree
Applicable at beamline(s)
KMC-1 Si(111):2 - 12 keV; Si(311): 4 - 12 keV; Si(422): 6 - 12 keV
U125-2_NIM 6(4) - 40 eV


Reflectometry - At-wavelength metrology

The Small Reflectometer is equipped with 3 UHV-compatible goniometers (Huber 408 and 410) and UHV stepper motors (Phytron) for varying the incidence angle at the sample and for positioning the detector in plane or out of plane. The reflection plane is vertical (i.e. in general s-polarisation geometry).

The station is flexible and it can be mounted on dipole or undulator beamlines, and is meant to complement the fixed reflectometer station in the optics hutch in energy ranges which are not accessible at the optics beamline, i.e. in the UV and x-ray range (NIM, DCM).

For more details please contact the Instrument Scientist(s).