Reflectometer

Reflectometry Station

Publications

2021

Feng, Y.; Huang, Q.; Zhuang, Y.; Sokolov, A.; Lemke, S.; Qi, R.; Zhang, Z.; Wang, Z.: Mo/Si lamellar multilayer gratings with high efficiency and enhanced resolution for the x-ray region of 1000-1700eV. , Optics Express 29 (2021), p. 13416-13427
doi: 10.1364/OE.422483

2020

Vainer, Y.A.; Garakhin, S.A.; Zuev, S.Y.; Nechay, A.N.; Pleshkov, R.S.; Polkovnikov, V.N.; Salashchenko, N.N.; Svechnikov, M.V.; Sertsu, M.G.; Smertin, R.M.; Sokolov, A.; Chkhalo, N.I.; Schäfers, F.: Beryllium-Based Multilayer Mirrors for the Soft X-Ray and Extreme Ultraviolet Wavelength Ranges. , Journal of Surface Investigation 14 (2020), p. 124-134
doi: 10.1134/s1027451020020160

Polkovnikov, V.N.; Salashchenko, N.N.; Svechnikov, M.V.; Chkhalo, N.I.: Beryllium-based multilayer X-ray optics. , Physics Uspekhi / Russian Academy of Sciences = Uspechi fizičeskich nauk 63 (2020), p. 83-95
doi: 10.3367/ufne.2019.05.038623

Yang, Y.; Huang, Q.; Kozhevnikov, I.V.; Liao, Y.; Qi, R.; Sokolov, A.A.; Zhang, Z.; Zhang, Z.; Wang, Z.: Comparative study of single-layer, bilayer, and trilayer mirrors with enhanced x-ray reflectance in 0.5- to 8-keV energy region. , Journal of Astronomical Telescopes, Instruments, and Systems 6 (2020), p. 044001 /1-12
doi: 10.1117/1.JATIS.6.4.044001

Mazuritskiy, M.I.; Lerer, A.M.: Focusing of Long-Wavelength X-Rays by Means of Spherical and Planar Microchannel Plates. , JETP Letters 112 (2020), p. 138-144
doi: 10.1134/s0021364020150072

Massahi, S.; Christensen, F. E.; Ferreira, D. D. M.; Svendsen, S.; Henriksen, P. L.; Vu, L. M.; Gellert, N. C.; Jegers, A. S.; Shortt, B.; Bavdaz, M.; Ferreira, I.; Collon, M.; Landgraf, B.; Girou, D.; Sokolov, A.; Schoenberger, W.: Investigation of boron carbide and iridium thin films, an enabling technology for future x-ray telescopes. , Applied Optics 59 (2020), p. 10902-10911
doi: 10.1364/AO.409453

Filatova, E.O.; Konashuk, A.S.; Sakhonenkov, S.S.; Gaisin, A.U.; Kolomiiets, N.M.; Afanas'ev, V.V.; Dekkers, H.F.W.: Mechanisms of TiN Effective Workfunction Tuning at Interfaces with HfO2 and SiO2. , The Journal of Physical Chemistry C 124 (2020), p. 15547-15557
doi: 10.1021/acs.jpcc.0c03605

Svechnikov, M.; Chkhalo, N.; Lopatin, A.; Pleshkov, R.; Polkovnikov, V.; Salashchenko, N.; Schäfers, F.; Sertsu, M.G.; Sokolov, A.; Tsybin, N.: Optical constants of sputtered beryllium thin films determined from photoabsorption measurements in the spectral range 20.4–250 eV. , Journal of Synchrotron Radiation 27 (2020), p. 75-82
doi: 10.1107/S1600577519014188

La Francesca, E.; Angelucci, M.; Liedl, A.; Spallino, L.; Gonzalez, L.A.; Bellafont, I.; Siewert, F.; Sertsu, M.G.; Sokolov, A.; Schäfers, F.; Cimino, R.: Reflectivity and photoelectron yield from copper in accelerators. , Physical Review Accelerators and Beams 23 (2020), p. 083101/1-15
doi: 10.1103/physrevaccelbeams.23.083101

Pleshkov, R.S.; Zuev, S.Y.; Polkovnikov, V.N.; Salashchenko, N.N.; Svechnikov, M.V.; Chkhalo, N.I.; Jonnard, P.: The Smoothing Effect of Si Layers in Multilayer Be/Al Mirrors for the 17- to 31-nm Range. , Technical Physics 65 (2020), p. 1786-1791
doi: 10.1134/s1063784220110201

Zhuang, Y.; Huang, Q.; Kozhevnikov, I.V.; Feng, J.; Qi, R.; Sokolov, A.; Senf, F.; Zhang, Z.; Wang, Z.: Theoretical analysis and development of high efficiency tender x-ray multilayer coated gratings. , In: Oleg Chubar, Kawal Sawhney [Ed.] : Advances in Computational Methods for X-Ray Optics V. Bellingham, WA: SPIE, 2020 (Proceedings of SPIE ; 11493). - ISBN 978-1-5106-3793-1, p. 114930R/1-10
doi: 10.1117/12.2567578

Huang, Q.; Kozhevnikov, I.; Sokolov, A.; Zhuang, Y.; Li, T.; Feng, J.; Siewert, F.; Viefhaus, J.; Zhang, Z.; Wang, Z.: Theoretical analysis and optimization of highly efficient multilayer-coated blazed gratings with high fix-focus constant for the tender X-ray region. , Optics Express 28 (2020), p. 821-845
doi: 10.1364/OE.28.000821

2019

Nikolay, C.; Alexey, L.; Andrey, N.; Dmitriy, P.; Alexey, P.; Vladimir, P.; Nikolay, S.; Franz, S.; Mewael, S.; Andrey, S.; Mikhail, S.; Nikolay, T.; Sergey, Z.: Beryllium-Based Multilayer Mirrors and Filters for the Extreme Ultraviolet Range. , Journal of Nanoscience and Nanotechnology 19 (2019), p. 546-553
doi: 10.1166/jnn.2019.16474

Mazuritskiy, M.I.; Lerer, A.M.; Dabagov, S.B.; Marcelli, A.; Hampai, D.; Dziedzic-Kocurek, K.: Focusing Properties of Bent Micro-Channel Plates in the X-Ray Range. , Journal of Surface Investigation 13 (2019), p. 1005-1013
doi: 10.1134/s1027451019060144

Zuev, S.Yu.; Pleshkov, R.S.; Polkovnikov, V.N.; Salashchenko, N.N.; Svechnikov, M.V.; Chkhalo, N.I.; Schäfers, F.; Sertsu, M.; Sokolov, A.: Influence of Beryllium Barrier Layers on the Properties of Mo/Si Multilayer Mirrors. , Technical Physics 64 (2019), p. 1688-1691
doi: 10.1134/S1063784219110318

Smertin, R.M.; Garakhin, S.A.; Zuev, S.Yu.; Nechai, A.N.; Polkovnikov, V.N.; Salashchenko, N.N.; Svechnikov, M.V.; Sertsu, M.G.; Sokolov, A.; Chkhalo, N.I.; Schäfers, F.; Yunin, P.A.: Influence of Thermal Annealing on the Properties of Multilayer Mo/Be Mirrors. , Technical Physics 64 (2019), p. 1692-1697
doi: 10.1134/S1063784219110252

Filatova, E.O.; Sakhonenkov, S.S.; Konashuk, A.S.; Kasatikov, S.A.; Afanas'ev, V.V.: Inhibition of Oxygen Scavenging by TiN at the TiN/SiO2 Interface by Atomic-Layer-Deposited Al2O3 Protective Interlayer. , The Journal of Physical Chemistry C 123 (2019), p. 22335-22344
doi: 10.1021/acs.jpcc.9b05800

Zuyev, S.Yu.; Pariev, D.E.; Pleshkov, R.S.; Polkovnikov, V.N.; Salashchenko, N.N.; Svechnikov, M.V.; Sertsu, M.G.; Sokolov, A.; Chkhalo, N.; Schäfers, F.: Mo/Si Multilayer Mirrors with B4C and Be Barrier Layers. , Journal of Surface Investigation 13 (2019), p. 169-172
doi: 10.1134/S1027451019020216

Huang, Q.; Feng, J.; Li, T.; Wang, X.; Kozhenikov, I.V.; Yang, Y.; Qui, R.; Sokolov, A.; Giday Sertsu, M.; Schäfers, F.; Li, W.; Xie, C.; Zhang, Z.; Wang, Z.: Narrowband lamellar multilayer grating with low contrast MoSi2/Si materials for soft X-ray region. , Journal of Physics D: Applied Physics 52 (2019), p. 195303/1-6
doi: 10.1088/1361-6463/ab0873

Mazuritskiy, M.I.; Lerer, A.M.; Kulov, S.K.; Samkanashvili, D.G.: On the Surface Structure of Microchannel Plates and the Excitation of X-Ray Fluorescence in Hollow Microcapillaries. , Journal of Surface Investigation 13 (2019), p. 499-507
doi: 10.1134/S1027451019030297

Gubarev, V.; Yakovlev, V.; Sertsu, M.; Yakushev, O.; Krivtsun, V.; Gladush, Y.; Ostanin, I.; Sokolov, A.; Schäfers, F.; Medvedev, V.; Nasibulin, A.: Single-walled carbon nanotube membranes for optical applications in the extreme ultraviolet range. , Carbon 155 (2019), p. 734-739
doi: 10.1016/j.carbon.2019.09.006

Lin, D.; Liu, Z.; Dietrich, K.; Sokolov, A.; Sertsu, M.G.; Zhou, H.; Huo, T.; Kroker, S.; Chen, H.; Qiu, K.; Xu, X.; Schäfers, F.; Liu, Y.; Kley, E.-B.; Hong, Y.: Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask. , Journal of Synchrotron Radiation 26 (2019), p. 1782-1789
doi: 10.1107/S1600577519008245

Polkovnikov, V.N.; Chkhalo, N.I.; Pleshkov, R.S.; Salashchenko, N.N.; Schäfers, F.; Sertsu, M.; Sokolov, A.; Svechnikov, M.V.; Zuev, S.Yu.: Stable high-reflection Be/Mg multilayer mirrors for solar astronomy at 30.4 nm. , Optics Letters 44 (2019), p. 263-266
doi: 10.1364/OL.44.000263

Polkovnikov, V.N.; Chkhalo, N.I.; Meltchakov, E.; Delmotte, F.; Zuev, S.Yu.; Salashchenko, N.N.; Svechnikov, M.V.; Tsybin, N.N.: Stable Multilayer Reflective Coatings for Λ(HeI) = 58.4 nm for the KORTES Solar Telescope. , Technical Physics Letters 45 (2019), p. 85–88
doi: 10.1134/S1063785019020147

2018

Dziarzhytski, S.; Siewert, F.; Sokolov, A.; Gwalt, G.; Seliger, T.; Rübhausen, M.; Weigelt, H.; Brenner, G.: Diffraction gratings metrology and ray-tracing results for an XUV Raman spectrometer at FLASH. , Journal of Synchrotron Radiation 25 (2018), p. 138-144
doi: 10.1107/S1600577517013066

Filatova, E.; Sokolov, A.: Effect of reflection and refraction on NEXAFS spectra measured in TEY mode. , Journal of Synchrotron Radiation 25 (2018), p. 232-240
doi: 10.1107/S1600577517016253

Sokolov, A.; Sertsu, M.; Gaupp, A.; Lüttecke, M.; Schäfers, F.: Efficient high-order suppression system for a metrology beamline. , Journal of Synchrotron Radiation 25 (2018), p. 100-107
doi: 10.1107/S1600577517016800

Svechnikov, M.V.; Chkhalo, N.I.; Gusev, S.A.; Nechay, A.N.; Pariev, D.E.; Pestov, A.E.; Polkovnikov, V.N.; Tatarskiy, D.A.; Salashchenko, N.N.; Schäfers, F.; Sertsu, M.G.; Sokolov, A.; Vainer, Y.A.; Zorina, M.V.: Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography. , Optics Express 26 (2018), p. 33718-33731
doi: 10.1364/OE.26.033718

Majhi, A.; Nayak, M.; Pradhan, P.C.; Filatova, E.O.; Sokolov, A.; Schäfers, F.: Soft X-ray Reflection Spectroscopy for Nano-Scaled Layered Structure Materials. , Scientific Reports 8 (2018), p. 15724/1-9
doi: 10.1038/s41598-018-34076-5

2017

Konashuk, A.; Filatova, E.; Sakhonenkov, S.; Afanas'ev, V.: Effect of deposition technique on chemical bonding and amount of porogen residues in organosilicate glass. , Microelectronic Engineering 178 (2017), p. 209-212
doi: 10.1016/j.mee.2017.05.038

Chkhalo, N.I.; Gusev, S.A.; Nechay, A.N.; Pariev, D.E.; Polkovnikov, V.N.; Salashchenko, N.N.; Schäfers, F.; Sertsu, M.G.; Sokolov, A.; Svechnikov, M.V.; Tatarsky, D.A.: High-reflection Mo/Be/Si multilayers for EUV lithography. , Optics Letters 42 (2017), p. 5070-5073
doi: 10.1364/OL.42.005070

Ghafoor, N.; Birch, J.; Aquila, A.; Gullikson, E.; Schäfers, F.: Impact of B4C on structure and optical performance of Cr/Sc multilayer X-ray mirrors. , Optics Express 25 (2017), p. 18274-18287
doi: 10.1364/OE.25.018274

Eggenstein, F.; Krivenkov, M.; Rudolph, I.; Sertsu, M.G.; Sokolov, A.; Varykhalov, A.; Wolf, J.; Zeschke, Th.; Schäfers, F.: Investigation of HF-plasma-treated soft x-ray optical elements. , In: Lahsen Assoufid ... [Ed.] : Advances in Metrology for X-Ray and EUV Optics VII. Bellingham, Washington: SPIE, 2017 (Proceedings of SPIE ; 10385). - ISBN 978-1-51061-227-3, p. 10385-1-7
doi: 10.1117/12.2272967

Mazuritskiy, M. I.; Dabagov, S. B.; Lerer, A. M.; Dziedzic-Kocurek, K.; Sokolov, A.; Coreno, M.; Turchini, S.; D'Elia, A.; Sacchi, M.; Marcelli, A.: Transmission diffractive patterns of large microchannel plates at soft X-ray energies. , Nuclear Instruments & Methods in Physics Research B 402 (2017), p. 282-286
doi: 10.1016/j.nimb.2017.02.075

2016

Sokolov, A.; Bischoff, P.; Eggenstein, F.; Erko, A.; Gaupp, A.; Künstner, S.; Mast, M.; Schmidt, J.-S.; Senf, F.; Siewert, F.; Zeschke, T.; Schäfers, F.: At-wavelength metrology facility for soft X-ray reflection optics. , Review of Scientific Instruments 87 (2016), p. 052005/1-7
doi: 10.1063/1.4950731

Nayak, M.; Pradhan, P.C.; Lodha, G.S.; Sokolov, A.; Schäfers, F.: Corrigendum: Determining Chemically and Spatially Resolved Atomic Profile of Low Contrast Interface Structure with High Resolution. , Scientific Reports 6 (2016), p. 27322/1-7
doi: 10.1038/srep27322

Gaikovich, P.K.; Polkovnikov, V.N.; Salashchenko, N.N.; Chkhalo, N.I.; Schäfers, F.; Sokolov, A.: Effect of roughness, deterministic and random errors in film thickness on the reflecting properties of aperiodic mirrors for the EUV range. , Quantum Electronics 46 (2016), p. 406-413
doi: 10.1070/QEL16037

Nayak, M.; Pradhan, P.C.; Lodha, G.S.; Sokolov, A.; Schäfers, F.: Erratum: Determining Chemically and Spatially resolved Atomic Profile of Low Contrast Interface Structure with High Resolution. , Scientific Reports 6 (2016), p. 31016/1
doi: 10.1038/srep31016

Senf, F.; Bijkerk, F.; Eggenstein, F.; Gwalt, G.; Huang, Q.; Kruijs, R.; Kutz, O.; Lemke, S.; Louis, E.; Mertin, M.; Packe, I.; Rudolph, I.; Schäfers, F.; Siewert, F.; Sokolov, A.; Sturm, J.M.; Waberski, C.; Wang, Z.; Wolf, J.; Zeschke, T.; Erko, A.: Highly efficient blazed grating with multilayer coating for tender X-ray energies. , Optics Express 24 (2016), p. 13220-13230
doi: 10.1364/OE.24.013220

Filatova, E.O.; Konashuk, A.S.; Schäfers, F.; Afanasev, V.V.: Metallization-Induced Oxygen Deficiency of γ-Al2O3 Layers. , The Journal of Physical Chemistry C 120 (2016), p. 8979-8985
doi: 10.1021/acs.jpcc.6b01352

Filatova, E.O.; Konashuk, A.S.; Petrov, Yu.; Ubyivovk, E.; Sokolov, A.A.; Selivanov, A.; Drozd, V.: NEXAFS study of electronic and atomic structure of active layer in Al/indium tin oxide/TiO2 stack during resistive switching. , Science and Technology of Advanced Materials 17 (2016), p. 274-284
doi: 10.1080/14686996.2016.1182851

Mantouvalou, I.; Witte, K.; Martyanov, W.; Jonas, A.; Groetzsch, D.; Streeck, C.; Löchel, H.; Rudolph, I.; Erko, A.; Stiel, H.; Kanngiesser, B.: Single shot near edge x-ray absorption fine structure spectroscopy in the laboratory. , Applied Physics Letters 108 (2016), p. 201106/1-4
doi: 10.1063/1.4951000

Eggenstein, F.; Bischoff, P.; Schäfers, F.; Schroeter, T.; Senf, F.; Sokolov, A.; Zeschke, T.; Erko, A.: Survey and adjustment methods applied on an 11 axes high performance reflectometer for synchrotron radiation. , AIP Conference Proceedings 1741 (2016), p. 030025/1-4
doi: 10.1063/1.4952848

Schäfers, F.; Bischoff, P.; Eggenstein, F.; Erko, A.; Gaupp, A.; Künstner, S.; Mast, M.; Schmidt, J.-S.; Senf, F.; Siewert, F.; Sokolov, A.; Zeschke, T.: The at-wavelength metrology facility for UV- and XUV-reflection and diffraction optics at BESSY-II. , Journal of Synchrotron Radiation 23 (2016), p. 66-77
doi: 10.1107/S1600577515020615

Jansing, C.; Mertins, H.-Ch.; Gilbert, M.; Wahab, H.; Timmers, H.; Choi, S.-H.; Gaupp, A.; Krivenkov, M.; Varykhalov, A.; Rader, O.; Legut, D.: X-ray natural birefringence in reflection from graphene. , Physical Review B 94 (2016), p. 045422/1-12
doi: 10.1103/PhysRevB.94.045422

2015

Kozhevnikov, I.V.; Filatova, E.O.; Sokolov, A.A.; Konashuk, A.S.; Siewert, F.; Störmer, M.; Gaudin, J.; Keitel, B.; Samoylova, L.; Sinn, H.: Comparative study of the X-ray reflectivity and in-depth profile of a-C, B4C and Ni coatings at 0.1–2 keV. , Journal of Synchrotron Radiation 22 (2015), p. 1-6
doi: 10.1107/S1600577515000430

Cimino, R.; Baglin, V.; Schäfers, F.: Potential remedies against the high Synchrotron Radiation induced heat load for future highest energy proton circular colliders. , Physical Review Letters 115 (2015), p. 264804/1-5
doi: 10.1103/PhysRevLett.115.264804

Hafner, A.; Anklamm, L.; Firsov, A.; Firsov, A.; Löchel, H.; Sokolov, A.; Gubzokov, R.; Erko, A.: Reflection zone plate wavelength-dispersive spectrometer for ultra-light elements measurements. , Optics Express 23 (2015), p. 29476-29483
doi: 10.1364/OE.23.029476

2014

Eggenstein, F.; Bischoff, P.; Gaupp, A.; Senf, F.; Sokolov, A.; Zeschke, Th.; Schäfers, F.: A reflectometer for at-wavelength characterization of XUV-reflection gratings. , In: Lahsen Assoufid [Ed.] : Advances in Metrology for X-Ray and EUV Optics V. SPIE, 2014 (Proceedings of SPIE ; 9206). - ISBN 978-1-62841-233-8, p. 920607/1-12
doi: 10.1117/12.2061828

Sokolov, A.A.; Eggenstein, F.; Erko, A.; Follath, R.; Künstner, S.; Mast, M.; Schmidt, J.S.; Senf, F.; Siewert, F.; Zeschke, Th.; Schäfers, F.: An XUV Optics Beamline at BESSY II. , In: Lahsen Assoufid [Ed.] : ADVANCES IN METROLOGY FOR X-RAY AND EUV OPTICS V : Conference on Advances in Metrology for X-Ray and EUV Optics V . SPIE, 2014 (Proceedings of SPIE , 9206), p. 92060J/1-13
doi: 10.1117/12.2061778

Filatova, E.O.; Kozhevnikov, I.V.; Sokolov, A.A.; Konashuk, A.S.; Schaefers, F.; Popovici, M.; Afanas’ev, VV.: Application of soft X-ray reflectometry for analysis of underlayer influence on structure of atomic-layer deposited SrTixOy films. , Journal of Electron Spectroscopy and Related Phenomena 196 (2014), p. 110-116
doi: 10.1016/j.elspec.2014.01.021

Konyushenko, M.A.; Konashuk, A.S.; Sokolov, A.A.; Schäfers, F.; Filatova, E.O.: Effect of thermal annealing and Al2O3-interlayer on intermixing in the TiN/SiO2/Si structure. , Journal of Electron Spectroscopy and Related Phenomena 196 (2014), p. 117-120
doi: 10.1016/j.elspec.2013.12.001

Cimino, R.; Schäfers, F.: Soft X-Ray Reflectivity and Photoelectron Yield of Technical Materials: Experimental Input for Instability Simulations in High Intensity Accelerators. , In: Proceedings of IPAC 2014, Dresden, Germany. Dresden, 2014. - ISBN 978-3-95450-132-8, p. 2335-2337

Filatova, E.O.; Baraban, A.P.; Konashuk, A.S.; Konyushenko, M.A.; Selivanov, A.A.; Sokolov, A.A.; Schäfers, F.; Drozd, V.E.: Transparent-conductive-oxide (TCO) buffer layer effect on the resistive switching process in metal/TCO/TiO2/metal assemblies. , New Journal of Physics 16 (2014), p. 113014/1-15
doi: 10.1088/1367-2630/16/11/113014

2013

Eggenstein, F.; Schäfers, F.; Erko, A.; Follath, R.; Gaupp, A.; Löchel, B.; Senf, F.; Zeschke, T.: A reflectometer for at-wavelength characterization of gratings. , Nuclear Instruments & Methods in Physics Research A 710 (2013), p. 166–171
doi: 10.1016/j.nima.2012.10.132

Chkhalo, N.I.; Künstner, S.; Polkovnikov, V.N.; Salashchenko, N.N.; Schäfers, F.; Starikov, S.D.: High performance La/B4C multilayer mirrors with C-barrier layers for the next generation lithography. , Applied Physics Letters 102 (2013), p. 011602/1-3
doi: 10.1063/1.4774298

Schäfers, F.; Cimino, R.: Soft X-ray Reflectivity : from Quasi-Perfect Mirrors to Accelerator Walls. , In: CERN [Ed.] : Joint INFN-CERN-EuCARD-AccNet Workshop on Electron-Cloud Effects ; ECLOUD'12 ; 5 - 9 Jun 2012, La Biodola, Isola d’Elba, Italy . Geneva, 2013 CERN-2013-002 ; INFN-12-26-LNF ; EuCARD-CON-2013-001, p. 105-115
doi: 10.5170/CERN-2013-002.105

Konashuk, A.S.; Sokolov, A.A.; Drozd, V.E.; Schaefers, F.; Filatova, E.O.: Study of Al2O3 nanolayers synthesized onto porous SiO2 using X-ray reflection spectroscopy. , Thin Solid Films 534 (2013), p. 363–366
doi: 10.1016/j.tsf.2013.03.020

Filatova, E.O.; Kozhevnikov, I.V.; Sokolov, A.A.; Yegorova, Yu.V.; Konashuk, A.S.; Vilkov, O.Yu; Schaefers, F.; Gorgoi, M.; Shulakov, A.S.: X-ray and photoelectron spectroscopic nondestructive methods for thin films and interfaces study. Application to SrTiO3 based heterostuctures. , Microelectronic Engineering 109 (2013), p. 13-16
doi: 10.1016/j.mee.2013.03.095

2012

Satapathy, D.K.; Uribe-Laverde, M.A.; Marozau, I.; Malik, V.K.; Das, S.; Wagner, Th.; Marcelot, C.; Stahn, J.; Brück, S.; Rühm, A.; Macke, S.; Tietze, T.; Goering, E.; Frano, A.; Kim, J.-H.; Wu, M.; Benckiser, E.; Keimer, B.; Devishvili, A.; Toperverg, B.P.; Merz, M.; Nagel, P.; Schuppler, S.; Bernhard, C.: Magnetic Proximity Effect in YBa2Cu3O7/La2/3Ca1/3MnO3 and YBa2Cu3O7/LaMnO3+delta Superlattices. , Physical Review Letters 108 (2012), p. /1-5
doi: 10.1103/PhysRevLett.108.197201

Philippe, B.; Dedryvere, R.; Allouche, J.; Lindgren, F.; Gorgoi, M.; Rensmo, H.; Gonbeau, D.; Edström, K.: Nanosilicon Electrodes for Lithium-Ion Batteries: Interfacial Mechanisms Studied by Hard and Soft X-ray Photoelectron Spectroscopy. , Chemistry of Materials 24 (2012), p. 1107-1115
doi: 10.1021/cm2034195

Modi, M.H; Rai, S.K.; Idir, M.; Schaefers, F.; Lodha, G.S.: NbC/Si multilayer mirror for next generation EUV light sources. , Optics Express 20 (2012), p. 15114-15120
doi: 10.1364/OE.20.015114

2011

Benckiser, E.; Haverkort, M.W.; Brueck, S.; Goering, E.; Macke, S.; Frano, A.; Yang, Xi.; Andersen, O.K.; Cristiani, G.; Habermeier, H.-U.; Boris, A.V.; Zegkinoglou, I.; Wochner, P.; Kim, H.-J.; Hinkov, V.; Keimer, B.: Orbital reflectometry of oxide heterostructures. , Nature Materials 10 (2011), p. 189-193
doi: 10.1038/NMAT2958

2010

Franta, D.; Necas, D.; Zajickova, L.; Bursikova, V.; Cobet, C.: Band structure of diamond-like carbon films assessed from optical measurements in wide spectral range. , Diamond and Related Materials 19 (2010), p. 114-122
doi: 10.1016/j.diamond.2009.08.003

Reflectometer