Optics Beamline

Optics Beamline

Publications

2018

Sokolov, A.; Sertsu, M.; Gaupp, A.; Lüttecke, M.; Schäfers, F.: Efficient high-order suppression system for a metrology beamline. , Journal of Synchrotron Radiation 25 (2018), p. 100-107
doi:10.1107/S1600577517016800

2017

Konashuk, A.; Filatova, E.; Sakhonenkov, S.; Afanas'ev, V.: Effect of deposition technique on chemical bonding and amount of porogen residues in organosilicate glass. , Microelectronic Engineering 178 (2017), p. 209-212
doi:10.1016/j.mee.2017.05.038

Chkhalo, N.I.; Gusev, S.A.; Nechay, A.N.; Pariev, D.E.; Polkovnikov, V.N.; Salashchenko, N.N.; Schäfers, F.; Sertsu, M.G.; Sokolov, A.; Svechnikov, M.V.; Tatarsky, D.A.: High-reflection Mo/Be/Si multilayers for EUV lithography. , Optics Letters 42 (2017), p. 5070-5073
doi:10.1364/OL.42.005070

Yin, Z.; Rehanek, J.; Löchel, H.; Braig, C.; Buck, J.; Firsov, A.; Viefhaus, J.; Erko, A.; Techert, S.: Highly efficient soft X-ray spectrometer based on a reflection zone plate for resonant inelastic X-ray scattering measurements. , Optics Express 25 (2017), p. 10984-10996
doi:10.1364/OE.25.010984

Ghafoor, N.; Birch, J.; Aquila, A.; Gullikson, E.; Schäfers, F.: Impact of B4C on structure and optical performance of Cr/Sc multilayer X-ray mirrors. , Optics Express 25 (2017), p. 18274-18287
doi:10.1364/OE.25.018274

Eggenstein, F.; Krivenkov, M.; Rudolph, I.; Sertsu, M.G.; Sokolov, A.; Varykhalov, A.; Wolf, J.; Zeschke, Th.; Schäfers, F.: Investigation of HF-plasma-treated soft x-ray optical elements. , In: Lahsen Assoufid ... [Ed.] : Advances in Metrology for X-Ray and EUV Optics VII. Bellingham, Washington: SPIE, 2017 (Proceedings of SPIE ; 10385). - ISBN 978-1-51061-227-3, p. 10385-1-7
doi:10.1117/12.2272967

Braig, C.; Sokolov, A.; Wilks, R.; Kozina, X.; Kunze, T.; Bjeoumikhova, S.; Thiel, M.; Erko, A.; Bär, M.: Polycapillary-boosted instrument performance in the extreme ultraviolet regime for inverse photoemission spectroscopy. , Optics Express 25 (2017), p. 31840-31852
doi:10.1364/OE.25.031840

Konashuk, A.S.; Filatova, E.O.: Redistribution of valence and conduction band states depending on the method of modification of SiO2 structure. , Physical Chemistry Chemical Physics 19 (2017), p. 26201-26209
doi:10.1039/c7cp04914e

Mazuritskiy, M.I.; Lerer, A.M.: Spectral and Diffraction Properties of Microchannel Plates in the Long-Wavelength X-Ray Range. , JETP LETTERS 105 (2017), p. 572-576
doi:10.1134/S0021364017090120

Mazuritskiy, M. I.; Dabagov, S. B.; Lerer, A. M.; Dziedzic-Kocurek, K.; Sokolov, A.; Coreno, M.; Turchini, S.; D'Elia, A.; Sacchi, M.; Marcelli, A.: Transmission diffractive patterns of large microchannel plates at soft X-ray energies. , Nuclear Instruments & Methods in Physics Research B 402 (2017), p. 282-286
doi:10.1016/j.nimb.2017.02.075

2016

Manyakin, M.D.; Kurganskii, S.I.; Dubrovskii, O.I.; Chuvenkova, O.A.; Domashevskaya, E.P.; Ryabtsev, S.V.; Ovsyannikov, R.; Turishchev, S.Yu.: A novel approach to the electronic structure and surface composition investigations of tin-oxygen system materials by means of X-ray absorption spectroscopy combined with ab initio calculations. , Computational Materials Science 121 (2016), p. 119-123
doi:10.1016/j.commatsci.2016.04.034

Sokolov, Andrey; Bischoff, Peter; Eggenstein, Frank; Erko, Alexei; Gaupp, Andreas; Künstner, S; Mast, Matthias; Schmidt, Jan-Simon; Senf, Friedmar; Siewert, Frank; Zeschke, Thomas; Schäfers, Franz: An EUV and XUV At-Wavelength Metrology facility at BESSY-II. , XX International Symposium Nanophysics and Nanoelectronics Nizhny Novgorod, Russia, 14.03.2016 - 18.03.2016 (2016)

Sokolov, A.; Bischoff, P.; Eggenstein, F.; Erko, A.; Gaupp, A.; Künstner, S.; Mast, M.; Schmidt, J.-S.; Senf, F.; Siewert, F.; Zeschke, T.; Schäfers, F.: At-wavelength metrology facility for soft X-ray reflection optics. , Review of Scientific Instruments 87 (2016), p. 052005/1-7
doi:10.1063/1.4950731

Nayak, M.; Pradhan, P.C.; Lodha, G.S.; Sokolov, A.; Schäfers, F.: Corrigendum: Determining Chemically and Spatially Resolved Atomic Profile of Low Contrast Interface Structure with High Resolution. , Scientific Reports 6 (2016), p. 27322/1-7
doi:10.1038/srep27322

Gaikovich, P.K.; Polkovnikov, V.N.; Salashchenko, N.N.; Chkhalo, N.I.; Schäfers, F.; Sokolov, A.: Effect of roughness, deterministic and random errors in film thickness on the reflecting properties of aperiodic mirrors for the EUV range. , Quantum Electronics 46 (2016), p. 406-413
doi:10.1070/QEL16037

Nayak, M.; Pradhan, P.C.; Lodha, G.S.; Sokolov, A.; Schäfers, F.: Erratum: Determining Chemically and Spatially resolved Atomic Profile of Low Contrast Interface Structure with High Resolution. , Scientific Reports 6 (2016), p. 31016/1
doi:10.1038/srep31016

Senf, F.; Bijkerk, F.; Eggenstein, F.; Gwalt, G.; Huang, Q.; Kruijs, R.; Kutz, O.; Lemke, S.; Louis, E.; Mertin, M.; Packe, I.; Rudolph, I.; Schäfers, F.; Siewert, F.; Sokolov, A.; Sturm, J.M.; Waberski, C.; Wang, Z.; Wolf, J.; Zeschke, T.; Erko, A.: Highly efficient blazed grating with multilayer coating for tender X-ray energies. , Optics Express 24 (2016), p. 13220-13230
doi:10.1364/OE.24.013220

Filatova, E.O.; Konashuk, A.S.; Schäfers, F.; Afanasev, V.V.: Metallization-Induced Oxygen Deficiency of γ-Al2O3 Layers. , Journal of Physical Chemistry C 120 (2016), p. 8979-8985
doi:10.1021/acs.jpcc.6b01352

Filatova, E.O.; Konashuk, A.S.; Petrov, Yu.; Ubyivovk, E.; Sokolov, A.A.; Selivanov, A.; Drozd, V.: NEXAFS study of electronic and atomic structure of active layer in Al/indium tin oxide/TiO2 stack during resistive switching. , Science and Technology of Advanced Materials 17 (2016), p. 274-284
doi:10.1080/14686996.2016.1182851

Opitz, A.; Wilke, A.; Amsalem, P.; Oehzelt, M.; Blum, R.-P.; Rabe, J.P.; Mizokuro, T.; Hörmann, U.; Hansson, R.; Moons, E.; Koch, N.: Organic heterojunctions: Contact induced molecular reorientation, interface states, and charge redistribution. , Scientific Reports 6 (2016), p. 21291
doi:10.1038/srep21291

Baumgärtel, P.; Witt, M.; Baensch, J.; Fabarius, M.; Erko, A.; Schäfers, F.; Schirmacher, H.: RAY-UI: A Powerful and Extensible User Interface for RAY. , AIP Conference Proceedings 1741 (2016), p. 040016/1-4
doi:10.1063/1.4952888

Mantouvalou, I.; Witte, K.; Martyanov, W.; Jonas, A.; Groetzsch, D.; Streeck, C.; Löchel, H.; Rudolph, I.; Erko, A.; Stiel, H.; Kanngiesser, B.: Single shot near edge x-ray absorption fine structure spectroscopy in the laboratory. , Applied Physics Letters 108 (2016), p. 201106/1-4
doi:10.1063/1.4951000

Eggenstein, F.; Bischoff, P.; Schäfers, F.; Schroeter, T.; Senf, F.; Sokolov, A.; Zeschke, T.; Erko, A.: Survey and adjustment methods applied on an 11 axes high performance reflectometer for synchrotron radiation. , AIP Conference Proceedings 1741 (2016), p. 030025/1-4
doi:10.1063/1.4952848

Schäfers, F.; Sokolov, A.: The At-Wavelength Metrology Facility at BESSY-II. , Journal of Large Scale Research Facilities JLSRF 2 (2016), p. A-50
doi:10.17815/jlsrf-2-72

Schäfers, F.; Bischoff, P.; Eggenstein, F.; Erko, A.; Gaupp, A.; Künstner, S.; Mast, M.; Schmidt, J.-S.; Senf, F.; Siewert, F.; Sokolov, A.; Zeschke, T.: The at-wavelength metrology facility for UV- and XUV-reflection and diffraction optics at BESSY-II. , Journal of Synchrotron Radiation 23 (2016), p. 66-77
doi:10.1107/S1600577515020615

2015

Firsov, A.; Firsov, A.; Löchel, H.; Probst, J.; Loukas, P.; Erko, A.: 3-Dimensional profiling for diffraction optical elements. , SPIE Optics + Optoelectronics Prague, 13.04.2015 - 16.04.2016 (2015)

Sokolov, Andrey; Bischoff, Peter; Eggenstein, Frank; Erko, Aleksei; Gaupp, Andreas; Künstner, Silvio; Mast, Matthias; Schmidt, Jan-Simon; Senf, Friedmar; Siewert, Frank; Zeschke, Thomas; Schäfers, Franz: An XUV At-Wavelength Metrology facility at BESSY-II. , 12th International Conference on Synchrotron Radiation Instrumentation (SRI 2015) New York City, 06.07.2015 - 10.07.2015 (2015)

Sokolov, Andrey; Bischoff, Peter; Eggenstein, Frank; Erko, Alexei; Gaupp, Andreas; Künstner, Silvio; Mast, Matthias; Schmidt, Jan-Simon; Senf, Fred; Siewert, Frank; Zeschke, Thomas; Schäfers, Franz: An XUV At-Wavelength Metrology facility at BESSY-II. , PTB Seminar VUV und EUV Berlin, 05.11.2015 - 06.11.2015 (2015)

Sokolov, Andrey; Bischoff, Peter; Eggenstein, Frank; Erko, Alexei; Gaupp, Andreas; Künstner, Silvio; Mast, Matthias; Schmidt, Jan-Simon; Siewert, Frank; Zeschke, Thomas; Schäfers, Franz: At-Wavelength Metrology facility for XUV reflection gratings. , Internat. Workshop X-ray Metrology IWXM Berkeley, CA USA, 13.07.2015 - 16.07.2015 (2015)

Siewert, Frank; Brzhezinskaya, Maria; Buchheim, Jana; Follath, Rolf; Senf, Friedmar; Pietzsch, Anette; Schneider, Gerd; Guttmann, Peter; Mast, Matthias; Schmidt, Jan-Simon; Zeschke, Thomas; Föhlisch, Alexander; Erko, Alexei: BESSY-II Photon Science – Instrumentation and Optics. , BESSY II - Imaging Workshop Helmholtz Zentrum Berlin, 05.10.2015 - 06.10.2015 (2015)

Peisert, H.; Uihlein, J.; Petraki, F.; Chassé, T.: Charge transfer between transition metal phthalocyanines and metal substrates: The role of the transition metal. , Journal of Electron Spectroscopy and Related Phenomena 204 (2015), p. 49-60
doi:10.1016/j.elspec.2015.01.005

Ciccullo, F.; Savu, S.-A.; Gerbi, A.; Bauer, M.; Ovsyannikov, R.; Cassinese, A.; Chassé, T.; Casu, M.B.: Chemisorption, morphology, and structure of a n-type perylene diimide derivative at the interface with gold: influence on devices from thin films to single molecules. , Chemistry - A European Journal 21 (2015), p. 3766-71
doi:10.1002/chem.201404901

Kozhevnikov, I.V.; Filatova, E.O.; Sokolov, A.A.; Konashuk, A.S.; Siewert, F.; Störmer, M.; Gaudin, J.; Keitel, B.; Samoylova, L.; Sinn, H.: Comparative study of the X-ray reflectivity and in-depth profile of a-C, B4C and Ni coatings at 0.1–2 keV. , Journal of Synchrotron Radiation 22 (2015), p. 1-6
doi:10.1107/S1600577515000430

Nayak, M.; Pradhan, P.C.; Lodha, G.S.; Sokolov, A.; Schäfers, F.: Determining Chemically and Spatially Resolved Atomic Profile of Low Contrast Interface Structure with High Resolution. , Scientific Reports 5 (2015), p. 8618/1-7
doi:10.1038/srep08618

Siewert, Frank; Buchheim, Jana; Eggenstein, Frank; Gwalt, Grzegorz; Kutz, Oliver; Loechel, Bernd; Lemke, Steffanie; Rudolph, Ivo; Schäfers, Franz; Schmidt, Martin; Senf, Friedmar; Seeliger, Tino; Sokolov, Andrey; Waberski, Christoph; Wolf, Johannes; Zeschke, Thomas; Zizak, Ivo; Nelles, Bruno; Erko, Alexei: Gratings for Synchroton- and FEL-beamlines – on a project for manufacturing ultra-precise gratings at Helmholtz Zentrum Berlin . , PhotonDiag 2015 - 2nd Workshop on FEL Photon Diagnostics, Instrumentation, and Beamlines International Centre for Theoretical Physics (ICTP), Trieste (I), 08.06.2015 - 10.06.2015 (2015)

Uihlein, J.; Polek, M.; Glaser, M.; Adler, H.; Ovsyannikov, R.; Bauer, M.; Ivanovic, M.; Preobrajenski, A.B.; Generalov, A.V.; Chasse, T.; Peisert, H.: Influence of Graphene on Charge Transfer between CoPc and Metals: The Role of Graphene-Substrate Coupling. , Journal of Physical Chemistry C 119 (2015), p. 15240-15247
doi:10.1021/acs.jpcc.5b02912

Adler, H.; Paszkiewicz, M.; Uihlein, J.; Polek, M.; Ovsyannikov, R.; Basova, T.V.; Chasse, T.; Peisert, H.: Interface Properties of VOPc on Ni(111) and Graphene/Ni(111): Orientation-Dependent Charge Transfer. , Journal of Physical Chemistry C 119 (2015), p. 8755-8762
doi:10.1021/acs.jpcc.5b01485

Erko, A.; Hafner, A.; Anklamm, L.; Firsov, A.; Löchel, H.; Sokolov, A.; Gubzokov, R.: iZPS-SEM: the new spectrometer for ultra-light elements. , 8. Fachtagung Prozessnahe Röntgenanalytik, PRORA Berlin, 11.11.2015 - 13.11.2015 (2015)

Dugan, G.F.; Sonnad, K.G.; Cimino, R.; Ishibashi, T.; Schäfers, F.: Measurements of x-ray scattering from accelerator vacuum chamber surfaces, and comparison with an analytical model. , Physical Review Special Topics - Accelerators and Beams 18 (2015), p. 040704/1-20
doi:10.1103/PhysRevSTAB.18.040704

Fernandez‐Herrero, Analia; Braig, Christoph; Löchel, Heike; Firsov, Alexander; Brzhezinskaya, Maria; Erko, Alexei: Multi‐wavelength reflection zone plate arrays for wide‐range soft X‐ray spectroscopy. , 2nd German-Swedish Workshop on X-ray Optics Berlin, 28.04.2015 - 30.04.2015 (2015)

Brzhezinskaya, Maria; Firsov, Alexander; Erko, Alexei: New Reflection Zone Plate Array Optics with Individual Depth Profiles for Ultra-fast X-Ray Applications. , 12th International Conference SRI-2015, , New York Ciry, 06.07.2015 - 10.07.2015 (2015)

Senf, Fred: Performance of a blazed multilayer grating for energies between 800 eV and 5000 eV, calculations and measurements. , 2nd German-Swedish Workshop on X-ray Optics Berlin, 28.04.2015 - 30.04.2015 (2015)

Cimino, R.; Baglin, V.; Schäfers, F.: Potential remedies against the high Synchrotron Radiation induced heat load for future highest energy proton circular colliders. , Physical Review Letters 115 (2015), p. 264804/1-5
doi:10.1103/PhysRevLett.115.264804

Winkler, S.; Amsalem, P.; Frisch, J.; Oehzelt, M.; Heimel, G.; Koch, N.: Probing the energy levels in hole-doped molecular semiconductors. , Materials Horizons 2 (2015), p. 427-433
doi:10.1039/c5mh00023h

Siewert, Frank; Buchheim, Jana; Eggenstein, Frank; Gwalt, Grzegorz; Kutz, Oliver; Loechel, Bernd; Lemke, Steffanie; Rudolph, Ivo; Schäfers, Franz; Senf, Friedmar; Seeliger, Tino; Sokolov, Andrey; Waberski, Christoph; Wolf, Johannes; Zeschke, Thomas; Zizak, Ivo; Nelles, Bruno; Erko, Alexei: Recent achievements on optical metrology and manufacturing of gratings at HZB . , Seminar at SLAC Stanford (USA), 17.02.2015 - 17.02.2015 (2015)

Hafner, A.; Anklamm, L.; Firsov, A.; Firsov, A.; Löchel, H.; Sokolov, A.; Gubzokov, R.; Erko, A.: Reflection zone plate wavelength-dispersive spectrometer for ultra-light elements measurements. , Optics Express 23 (2015), p. 29476-29483
doi:10.1364/OE.23.029476

Eggenstein, Frank; Bischoff, Peter; Erko, Aleksei; Schroeter, Thomas; Senf, Friedmar; Sokolov, Andrey; Zeschke, Thomas; Schäfers, Franz: Survey and adjustment methods applied on an 11 axes high performance reflectometer for synchrotron radiation. , 12th International Conference on Synchrotron Radiation Instrumentation (SRI 2015) New York City, 06.07.2015 - 10.07.2015 (2015)

Sokolov, Andrey; Bischoff, Peter; Eggenstein, Frank; Erko, Aleksei; Gaupp, Andreas; Künstner, Silvio; Mast, Matthias; Schmidt, Jan-Simon; Senf, Friedmar; Siewert, Frank; Zeschke, Thomas; Schäfers, Franz: The At-Wavelength Metrology facility for UV- and XUV- optics at BESSY-II. , Second Swedish-German Workshop on X-Ray Optics Berlin, 28.04.2015 - 30.04.2015 (2015)

Schäfers, Franz; Bischoff, Peter; Eggenstein, Frank; Erko, Alexei; Gaupp, Andreas; Künstner, Silvio; Mast, Matthias; Schmidt, Jan-Simon; Senf, Fred; Siewert, Frank; Sokolov, Andrey; Zeschke, Thomas: The At-Wavelength Metrology facility for UV- and XUV-reflection optics at BESSY-II. , Workshop on Photon Diagnostics PhotonDiag2015 Trieste, 08.06.2015 - 10.06.2015 (2015)

Filatova, Elena; Konashuk, Alexei; Konyushenko, Marina; Sokolov, Andrey; Kozhevnikov, Igor: X-ray spectroscopic studies of metal/insulator (transition-metal-oxide) interface. , 12th International Conference on Nanosciences & Nanotechnologies – NN15 Thessaloniki, Greece, 07.07.2015 - 10.07.2015 (2015)

2014

Uihlein, J.; Peisert, H.; Adler, H.; Glaser, M.; Polek, M.; Ovsyannikov, R.; Bauer, M.; Chasse, T.: Strong Interaction of MnPc on Ni(111): Influence of Graphene Buffer Layer. , Journal of Physical Chemistry C 118 (2014), p. 28671-28678
doi:10.1021/jp5095036

2013

Heimel, G.; Duhm, S.; Salzmann, I.; Gerlach, A.; Strozecka, A.; Niederhausen, J.; Bürker, C.; Hosokai, T.; Fernandez-Torrente, I.; Schulze, G.; Winkler, S.; Wilke, A.; Schlesinger, R.; Frisch, J.; Bröker, B.; Vollmer, A.; Detlefs, B.; Pflaum, J.; Kera, S.; Franke, K.J.; Ueno, N.; Pascual, J.I.; Schreiber, F.; Koch, N.: Charged and metallic molecular monolayers through surface-induced aromatic stabilization. , Nature Chemistry 5 (2013), p. 187-194
doi:10.1038/NCHEM.1572

2012

Salzmann, I.; Moser, A.; Oehzelt, M.; Breuer, T.; Feng, X.; Juang, Z.-Y.; Nabok, D.; Della Valle, R.G.; Duhm, S.; Heimel, G.; Brillante, A.; Venuti, E.; Bilotti, I.; Christodoulou, C.; Frisch, J.; Puschnig, P.; Draxl, C.; Witte, G.; Müllen, K.; Koch, N.: Epitaxial Growth of pi-Stacked Perfluoropentacene on Graphene-Coated Quartz. , ACS Nano 6 (2012), p. 10874-10883
doi:10.1021/nn3042607

Optics Beamline