• Harbauer, K.; Welzel, T.; Ellmer, K.: A combined sensor for the diagnostics of plasma and film properties in magnetron sputtering processes. Thin Solid Films 520 (2012), p. 6429-6433

10.1016/j.tsf.2012.06.053

Abstract:
A combined sensor for the simultaneous measurement of plasma and deposition parameters has been designed and built. It comprises (i) a quartz crystal microbalance, (ii) a planar Langmuir probe and (iii) a calorimetric (Gardon) probe, which allows to measure the deposition rate, typical plasma parameters (plasma density and electron temperature) and the total energy input into a growing film. The combined sensor is electrically insulated against ground, allowing these measurements also for floating or substrate-bias conditions. These parameters are measured (nearly) simultaneously, controlled by a specific measurement and analysis program. The operation of this combined sensor is demonstrated for the deposition of copper and tungsten films with a 2 inch planar magnetron.