Uschakow, S.; Gaupp, A.; MacDonald, M.; Schäfers, F.: EUV Ellipsometry on Mo/Si Multilayers. Journal of Physics: Conference Series 425 (2013), p. 152011/1-4
10.1088/1742-6596/425/15/152011
Open Access Version (externer Anbieter)
Abstract:
We investigate polarisation properties of a reflective Mo/Si multilayer system in the EUV range using polarized synchrotron radiation at BESSY-II. The characterization involves reflectivity measurements with s- and p-polarized light as a function of the wavelength for three different angles near normal incidence. The phase retardance is determined near normal incidence for one fixed angle of incidence as a function of the wavelength. As an additional spin-off of the polarimetry measurement the Stokes parameters of the beamline could be determined. With the 8-axis UHV-polarimeter we have measured the complex reflection coefficients for the first time and establish this ellipsometry technique as an additional sensitive probe to characterize and model multilayer optical elements.