• 
  Sokolov, A.A.; Ovchinnikov, A.A.; Lysenkov, K.M.; Marchenko, D.E.; Filatova, E.O.: X-ray spectroscopic examination of thin HfO₂ films ALD- and MOCVD-grown on the Si(100) surface. Technical Physics 55 (2010), p. 1045-1050

10.1134/S1063784210070200