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  Garcia-Valenzuela, J.A.; Rivera, R.; Morales-Vilches, A.B.; Gerling, L.G.; Caballero, A.; Asensi, J.M.; Voz, C.; Bertomeu, J.; Andreu, J.: Main properties of Al2O3 thin films deposited by magnetron sputtering of an Al₂O₃ ceramic target at different radio-frequency power and argon pressure and their passivation effect on p-type c-Si wafers. Thin Solid Films 619 (2016), p. 288-296

10.1016/j.tsf.2016.10.049
Open Access Version (externer Anbieter)