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Overview of the deposition cluster from different angles

Silicon Deposition Cluster

Depositions of silicon-related materials in EMIL are carried out in a cluster tool manufactured by Altatech.

In the cluster tool, different process chambers are arranged around a central handling chamber equipped with a handling robot.

Up to ten samples,  wafers up to diameters of 6” or square shaped substrates up to 10x10 cm2, can be introduced into the load-lock. The cluster tool comprises four different depositions chambers, two PECVD chambers, one ALD chamber and one PVD chamber.

An additional chamber of the cluster system is connected to the UHV backbone of the SISSY lab via a sample separation chamber.

Find detailed information on the silicon deposition cluster on the web page of the Institute of Silicon Photovoltaics