| Instrument | Sample types | Laboratory assignment | Contact |
|---|
| IR polarimetry for in-situ spectroscopy | Multilayer/Film, Crystal, Liquid | in-Situ-Labor | Karsten Hinrichs
Andreas Furchner |
| IR polarimetry of thin films | Multilayer/Film, Crystal | in-Situ-Labor | Karsten Hinrichs
Andreas Furchner |
| Photothermal AFM-IR | Multilayer/Film, Crystal | Labor Raum 123 Gebäude 19.2 | Karsten Hinrichs |
| IR microscopy | Powder, Multilayer/Film, Amorphous, Crystal | Labor Raum 123 Gebäude 19.2 | Karsten Hinrichs |
| Vacuum chamber for optical spectroscopy | Multilayer/Film, Crystal | UHV / In-Situ-Labor |
Karsten Hinrichs |
| IR Mueller-Matrix ellipsometry | Multilayer/Film, Amorphous, Crystal | Referenz-Labor | Andreas Furchner
Karsten Hinrichs |
| IR laser ellipsometry | Multilayer/Film, Amorphous, Crystal, Liquid | Labor Raum 142 Gebäude 19.2 | Andreas Furchner
Karsten Hinrichs |
| 1 PANalytical MPD for thin film analysis (LMC) | | X-Ray CoreLab | Michael Tovar
Rene Schwiddessen |
| 4 Bruker D8 Advance for thin film analysis (LMC) | | X-Ray CoreLab | Michael Tovar |
| Bruker D8 Advance (WCRC) | Powder, Multilayer/Film, Gas | SCALA, X-Ray CoreLab | Alejandra Ramírez Caro
|
