The UE49-PGM SPEEM beam line hosts a dedicated photo-electron emission microscope (PEEM) devoted to element-selective and magnetic-sensitive space resolved investigations. For a detailed description of the PEEM as well as for an overview of the experimental possibilities of our microscope, please visit the SPEEM (link in table below).
|Temperature range||45 - 600 K|
|Pressure range||10-11 - 10-9 mbar|
|Source||UE49 (Elliptical Undulator)|
|Energy range||100 - 1800 eV|
|Energy resolution||10000 at 700 eV|
|Flux||1011 - 1013 ph/s/100 mA|
|Divergence horizontal||2.3 mrad|
|Divergence vertical||0.79 mrad|
|Focus size (hor. x vert.)||20 μm X 10 μm at sample position|
|User endstation||not possible|
|Distance Focus/last valve||500 mm|
|Height Focus/floor level||1379 mm|
|Phone||+49 30 8062 14750|
At typical working conditions of the microscope the field of view is about 3 –10 µm. Therefore the highest possible photon flux within the field of view of the microscope is necessary in order to achieve high spatial resolution and maximize the collection efficiency.
The UE49-PGM SPEEM beam line allows full polarization control of the incoming beam-delivering light of circular, elliptical and horizontal polarization- in combination with a high transmittance and a careful refocusing of the photon beam. A dedicated elliptical refocusing mirror has been designed to achieving a foot print of the incoming x-ray beam on the sample of 10 μm (vertical) X 20 μm (Horizontal).
The spectral range covered extends from 80 to 1800 eV, with a spectral resolution of 10000 at 700 eV. The photon flux delivered into the focused spot ranges from 10-11 to 10-13 ph/s/100 mA.