PHARAO

X-ray diffraction during MBE

The PHARAO experiment combines molecular beam epitaxy (MBE) with the option to monitor crystal growth and related phenomena at interfaces and surfaces under ultra high vacuum conditions in-situ by high-resolution x-ray diffraction. Therefore, our growth chamber is equipped with cylindrical, x-ray transparent Be-windows for the incident and diffracted x-rays. Recently PHARAO hosts a highly specialized chamber for the growth of oxide materials to pioneer crystal growth and growth related phenomena of new materials (as e.g. two-dimensional van der Waals systems) using in-situ capabilities.

Anwendungsbeispiele:
  • study of surface and interface phenomena during crystal growth via molecular beam epitaxy
  • strain induced phase formation and stabilization
  • crystal lattice dynamics upon thermal annealing under UHV conditions

Methods

Surface Diffraction

Remote access

not possible

Beamline data
Energy range 6 - 12 keV
Energy resolution 1500
Flux 109 cps
Polarisation horizontal
Focus size (hor. x vert.) 0.5 mm x 0.5 mm
Phone --
Weitere Details U125-2_KMC
Station data
Temperature range 280 - 1273 K
Pressure range UHV
Detector Dectris 300k
Manipulators --
Sample holder compatibility --
Additional equipment

The PHARAO experiment operates as a collaborating research group (CRG) beamline and is maintained by the Paul-Drude-Institut (PDI) für Festkörperelektronik Berlin, Institut der Leibniz-Gemeinschaft.

For details and current status of the experimental station please contact Michael Hanke hanke@pdi-berlin.de.