Microscope Nikon @Cleanroom EMIL
Microscope
The Nikon LV150N optical microscope is a versatile system for high-resolution material and surface analysis. It enables investigations at magnifications of up to 150× and provides various contrast techniques such as bright-field, dark-field, and DIC microscopy (Differential Interference Contrast). This allows precise visualization and evaluation of surface structures as well as fine topographical differences.
Selected Applications:- Analysis of silicon samples after wet-chemical etching
- Investigation of etched surface structures
- Detection and evaluation of surface defects and imperfections
- Characterization of etching patterns and crystal structures
- Microscopic examination of material homogeneity and surface morphology
Methods
The instrument can be used
Laboratories
Sample types
Amorphous, Crystal, Multilayer/Film
| Short description | Optical microscope |
| Usage | internal usage |
| Building/room | 14.54 (EMIL) /0013 |
| Location | Adlershof |
| Additional information | In radiation protection area. Operation permitted only after completed laboratory training/instruction. |
| Instrument parameter | |
| Microscope Type | Upright reflected-light microscope |
| Observation Methods | Brightfield, Darkfield, DIC, Polarization |
| Maximum Magnification | 5x, 50x, 100x, 150x |
| Focusing System | Coarse and fine focus adjustment |
| Fine Focus Resolution | 1 µm graduation |
| Sample Applications | Silicon wafer and material surface inspection |
For more details and current status of the Instrument please contact the Instrument Scientist.