PECVD @ SISSY

plasma-enhanced chemical vapour deposition

Methods

Making thin films

The instrument can be used

in cooperation with the organisational unit

Laboratories

SISSY

Sample types

Gas, Multilayer/Film

Short description
Usage
Building/room 14.54 (EMIL)/007
Location Adlershof
Additional information
Instrument parameter

For more details and current status of the Instrument please contact the Instrument Scientist.