Kot, M.; Henkel, K.; Müller, K.; Kegelmann, L.; Albrecht, S.; Tsud, N.; Kús, P.; Matolinová, I.; Schmeißer, D.: Al2O3-Atomic Layer Deposited Films on CH3NH3PbI3: Intrinsic Defects and Passivation Mechanisms. Energy Technology 7 (2019)
10.1002/ente.201900975
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