Hassa, A.; Sturm, C.; Kneiss, M.; Splith, D.; von Wenckstern, H.; Schultz, T.; Koch, N.; Lorenz, M.; Grundmann, M.: Solubility limit and material properties of a κ-(AlxGa1-x)2O3 thin film with a lateral cation gradient on (00.1)Al2O3 by tin-assisted PLD. APL Materials 8 (2020), p. 021103/1-6
10.1063/1.5141041
Open Access version by external provider