Wolke, K.; Gottschalk, Ch.; Moldovan, A.; Oltersdorf, A.; Angermann, H.: Ozone based chemical oxide growth for crystalline silicon solar cell production. In: Ossenbrink, H. [u.a.] [Eds.] : 26th European Photovoltaic Solar Energy Conference 5 - 9 September, Hamburg, GermanyMünchen: WIP, 2011. - ISBN 3-936338-27-2, p. 839-842
Abstract:
Treatment of crystalline silicon solar cells with ozone dissolved in ultra pure water is a low cost alternative to improve surface characteristics before and after emitter formation. The impact of dissolved ozone treatment after texturing has been investigated with respect to interface state densities and the possibility of improving the emitter formation with a low cost process enhancement. The chemically grown thin oxide improves wetting capability without modification of other surface characteristics that can impact cell efficiency. It could be shown that already low concentrations of ozone in ultra pure water (UPW) prior to phosphorus doping improves sheet resistance uniformity on Cz-Si and multi-crystalline (mc) silicon solar cells by 30-50%.