Eggenstein, F.; Bischoff, P.; Gaupp, A.; Senf, F.; Sokolov, A.; Zeschke, Th.; Schäfers, F.: A reflectometer for at-wavelength characterization of XUV-reflection gratings. In: Lahsen Assoufid [Ed.] : Advances in Metrology for X-Ray and EUV Optics V. SPIE, 2014 (Proceedings of SPIE ; 9206). - ISBN 978-1-62841-233-8, p. 920607/1-12

In our institute a technology centre for production and characterisation of highly efficient precision gratings is established. Within this project a new eflectometer for at-wavelength characterisation of the fabricated blazed gratings has been developed and produced. This new chamber complements our SR-based metrology instrumentation, namely the existing reflectometer [1] and the polarimeter/ellipsometer chamber for polarisation studies on magnetic or non-magnetic samples [2]. The main feature of the new reflectometer is the possibility to incorporate real gratings with dimensions up to 300 x 60 x 60 mm3 into the UHV-chamber. The samples are adjustable within six degrees of freedom by a newly developed UHV-tripod system, and the reflectivity can be measured between 0 and 90 degrees incidence angle for both s- and p-polarisation geometry. A variety of detectors will be accessable with a high dynamic range of at least 10 orders of magnitude. The reflectometer is coupled permanently to a new optics beamline [3] on a BESSY-II bending magnet operating in the UV, EUV and soft x-ray range with the polarisation adjustable to either linear or elliptical. It will be available by the end of 2014.