Berger, L.; Madajska, K.; Szymanska, I.B.; Höflich, K.; Polyakov, M.N.; Jurczyk, J.; Carlos, G.-N.; Utke, I.: Gas-assisted silver deposition with a focused electron beam. Beilstein Journal of Nanotechnology 2018 (2018), p. 224-232
10.3762/bjnano.9.24
Open Access Version
Abstract:
Focused electron beam induced deposition (FEBID) is a flexible direct write method to obtain defined structures with a high lateral resolution. In order to use this technique in application fields like plasmonics, suitable precursors which allow the deposition of desired materials have to be identified. Well known for its plasmonic properties, silver represents an interesting candidate for FEBID. For this purpose the carboxylate complex silver(I) pentafluoropropionate (AgO2CC2F5) was used for the first time in FEBID and resulted in deposits with high silver contents up to 76 at.%. As verified by TEM investigations, the deposited material is composed of pure silver crystallites in a carbon matrix. It showed good electrical properties and a strong Raman signal enhancement. Interestingly, silver crystal growth presents a strong dependency on electron dose and precursor refreshment.