• 
  Wu, C.; Bender, M.; Jonckheere, R.; Scholze, F.; Bekman, H.; Van Putten, M.; De Zanger, R.; Ebeling, R.; Westerhout, J.; Nicolai, K.; Van Veldhoven, J.; De Rooij-Lohmann, V.; Kievit, O.; Deutz, A.: Lifetime test on EUV photomask with EBL2. In: Akihiko Ando [Ed.] : Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology : 16-18 April 2019, Yokohama, JapanBellingham, Wash: SPIE, 2019 (Proceedings of SPIE ; 11178). - ISBN 978-1-5106-3073-4, p. 111780/1-6

10.1117/12.2537734
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