UE52_SGM
Soft X-ray undulator radiation variable polarization with SGM and resonant bunch excitation
Soft x-ray beamline for flexible end stations with variable polarization covering the range of 100 - 1500 eV with an x-ray spot size of approximately 60 µm (horizontal). The polarization can be freely chosen between linear (any orientation) and circular. Resonant Pulse excitation allows for "single bunch on demand".
Optical layout of the SGM beamline at the undulator UE52.
Taken from Senf et al. Nucl. Instrum. Meth. Phys. Res. A 467-468, 474-478(2001).
Taken from Senf et al. Nucl. Instrum. Meth. Phys. Res. A 467-468, 474-478(2001).
Beamline data | |
---|---|
Segment | H09 |
Location (Pillar) | 10.2 |
Source | UE52 (Elliptical Undulator) |
Monochromator | SGM |
Energy range | 100 - 1500 eV |
Energy resolution | > 4,000 |
Flux | > 1012 |
Polarisation | variable |
Divergence horizontal | 6 mrad |
Divergence vertical | 1 mrad |
Focus size (hor. x vert.) | 60 µm (hor) |
User endstation | no |
Distance Focus/last valve | 530 mm |
Height Focus/floor level | 1417 mm |
Beam availability | 12h/d |
Phone | +49 30 8062 13431 |
Premonochromator optics | M1: cylindrical mirror, horizontal deflection, 2Θ=175o, gold coated, water cooled, vertical demagnification (17:2.5) of source on entrance slit |
Entrance slit | Slit setting: 0-2000 μm, water cooling, insolated blades for vertical beam position sensing, on line laser diffraction slit width monitor |
Monochromator | Principle: variable deflection angle, focused spherical grating monochromator Optical components: M2: plane mirror, vertical deflection, 2Θ=169-175o, gold coated, water cooled G1-3: spherical gratings, vertical deflection, 2Θ=169-175o, gold coated, water cooled |
Exit slit | Slit setting= 0-2000 μm, ±200 mm translation, on line laser diffraction slitwidth monitor |
Postmonochromator optics | M3: cylindrical mirror, horizontal deflection, 2Θ=176o, gold coated, vertical demagnification (1:1) of exit slit M4: plane elliptical mirror, horizontal deflection, 2Θ=176o, gold coated, horizontal demagnification of source |
References | F. Senf et al. Nucl. Instrum. Meth. A 467-468, 474-478 (2001). K. Godehusen, Phys. Rev. A 68, 012711 (2003) |
Applicable station(s) | |
AXSYS TES | 20 K - room temperature |
AXSYS-nmTransmission NEXAFS | room temperature |
Photon flux versus photon energy for the three gratings with 900, 1200 and with 1500 l/mm and with,
from top to bottom, horizontally, vertically and circularly polarized light (for an exit slit width of 20 µm). Resolving power of UE52-SGM versus photon energy as covered by the 1st, 3rd and 5th undulator harmonics
for the three gratings of the monochromator and for two representative settings of the exit slit (10 and 20 µm). Beam at UE52-SGM in focus position (17 um x 23 um) measured on 17-04-2015 Beam at UE52-SGM 30 mm out of focus position upstream measured on 17-04-2015 Beam at UE52-SGM 30 mm out of focus position downstream measured on 17-04-2015 Experimental Area for UE52-SGM
from top to bottom, horizontally, vertically and circularly polarized light (for an exit slit width of 20 µm). Resolving power of UE52-SGM versus photon energy as covered by the 1st, 3rd and 5th undulator harmonics
for the three gratings of the monochromator and for two representative settings of the exit slit (10 and 20 µm). Beam at UE52-SGM in focus position (17 um x 23 um) measured on 17-04-2015 Beam at UE52-SGM 30 mm out of focus position upstream measured on 17-04-2015 Beam at UE52-SGM 30 mm out of focus position downstream measured on 17-04-2015 Experimental Area for UE52-SGM