The UE49-PGMa beam line hosts a dedicated photo-electron emission microscope (PEEM) devoted to element-selective and magnetic-sensitive space resolved investigations. For a detailed description of the PEEM as well as for an overview of the experimental possibilities of our microscope, please visit the following link XPEEM.
At typical working conditions of the microscope the field of view is about 3 –10 µm. Therefore the highest possible photon flux within the field of view of the microscope is necessary in order to achieve high spatial resolution and maximize the collection efficiency.
The UE49-PGMa beam line allows full polarization control of the incoming beam-delivering light of circular, elliptical and horizontal polarization- in combination with a high transmittance and a careful refocusing of the photon beam. A dedicated elliptical refocusing mirror has been designed to achieving a foot print of the incoming x-ray beam on the sample of 10 μm (vertical) X 20 μm (Horizontal).
The spectral range covered extends from 80 to 1800 eV, with a spectral resolution of 10000 at 700 eV. The photon flux delivered into the focused spot ranges from 10e-11 to 10e-13 ph/s/100 mA.
|Temperature range||Pressure Range|
|SPEEM||45 - 600 K||--|
|Source||UE49 (Elliptical Undulator)|
|Energy range||100 - 1800 eV|
|Energy resolution||10000 at 700 eV|
|Flux||1e11 - 1e13|
|Divergence horizontal||2.3 mrad|
|Divergence vertical||0.79 mrad|
|Focus size (hor. x vert.)||10 μm (vertical) X 20 μm (Horizontal) at sample position|
|User endstation||not possible|
|Distance Focus/last valve||500 mm|
|Height Focus/floor level||1379 mm|
|Phone||+49 30 8062 14750|