SPEEM
Spin resolved Photoemission Microscope
SPEEM is designed for studying sub-100nm scale magnetoelectronic devices by combining a spin-resolved photoemission microscope with a dedicated microfocus beamline offering full x-ray polarization control. The synergy between the microscopy capabilities of the PEEM and the polarization control of synchrotron radiation makes X-PEEM the ideal tool for spatially resolved and element selective investigation of nanostructures by means of chemical maps (XAS) and magnetic imaging (XMCD and XLD).
Methods
XMLD, XMCD, Time-resolved studies, NEXAFS, X-ray Microscopy, Photoelectron EM, XPS, Spin-resovled PES
Remote access
not possible
| Beamline data | |
|---|---|
| Energy range | 100 - 1800 eV |
| Energy resolution | 10000 at 700 eV |
| Flux | 1e11 - 1e13 |
| Polarisation | variable |
| Focus size (hor. x vert.) | 10 μm (vertical) X 20 μm (Horizontal) at sample position |
| Phone | +49 30 8062 14750 |
| More details | UE49_PGM SPEEM |
| Station data | |
| Temperature range | 45 - 600 K |
| Pressure range | -- |
| Detector | -- |
| Manipulators | -- |
| Sample holder compatibility | -- |
| Additional equipment | |
| Sample size | 2mmX2mm to 20mmX20mm |
| Sample holders | Simultaneous temperature, magnetic and electric field control |
| Magnetic field | holders for in- and out of plane magnetic fields up to 100 Oe |
| Electric field | Up to 200 V out of plane |
| Beam focus size on sample | 20(V)X30(H) micrometer |
| Sample storage in vacuum | up to 6 |
| in-situ evaporation | Fe, Co, Ni, Al... |
| in-situ sputtering | Ar and O |
Magnetic nanostructures are at the heart of modern data storage technology. Typical dimensions of magnetic bits are in the sub-100nm region. In addition novel magnetoelectronics devices such as magnetic random access memory junctions are operated on the sub-100nm m scale. An understanding magnetic properties of such low-dimensional structures is only accessible to spectro-microscopy tools capable of appropriate lateral resolution. This goal is achieved by combining a novel spin-resolved photoemission microscope (SPEEM) with a dedicated microfocus PGM beamline with full x-ray polarization control (UE49-PGMa).
The synergy between the microscopy capabilities of the PEEM and the polarization control of synchrotron radiation makes of X-PEEM the ideal tool for space resolved and element selective investigation of nanostructures by means of chemical maps (XAS) and magnetic imaging (XMCD and XLD).
For a detailed description of the experimental station as well as for an overview of the experimental possibilities of our microscope, please visit the following link XPEEM to get more information about sample holders and sample environment, possibilities for in-situ sample preparation and time-resolved experiments.