SPEEM
Spin resolved Photoemission Microscope
Magnetic nanostructures are at the heart of modern data storage technology. Typical dimensions of magnetic bits are in the sub-100nm region. In addition novel magnetoelectronics devices such as magnetic random access memory junctions are operated on the sub-100nm m scale. An understanding magnetic properties of such low-dimensional structures is only accessible to spectro-microscopy tools capable of appropriate lateral resolution. This goal is achieved by combining a novel spin-resolved photoemission microscope (SPEEM) with a dedicated microfocus PGM beamline with full x-ray polarization control (UE49-PGMa).
The synergy between the microscopy capabilities of the PEEM and the polarization control of synchrotron radiation makes of X-PEEM the ideal tool for space resolved and element selective investigation of nanostructures by means of chemical maps (XAS) and magnetic imaging (XMCD and XLD).
For a detailed description of the experimental station as well as for an overview of the experimental possibilities of our microscope, please visit the following link XPEEM to get more information about sample holders and sample environment, possibilities for in-situ sample preparation and time-resolved experiments.
Methods
XMLD, Time-resolved studies, NEXAFS, XMCD, Photoelectron EM, X-ray Microscopy, Spin-resovled PES, XPS
Assigned to beamline(s)
| Energy range | Polarisation | |
|---|---|---|
| UE49_PGM SPEEM | 100 - 1800 eV | variable |
| Station data | |
|---|---|
| Temperature range | 45 - 600 K |
| Pressure Range | -- |
| Detector | -- |
| Manipulators | -- |
| Sample holder compatibility | -- |
| Sample size | 2mmX2mm to 20mmX20mm |
| Sample holders | Simultaneous temperature, magnetic and electric field control |
| Magnetic field | holders for in- and out of plane magnetic fields up to 100 Oe |
| Electric field | Up to 200 V out of plane |
| Beam focus size on sample | 20(V)X30(H) micrometer |
| Sample storage in vacuum | up to 6 |
| in-situ evaporation | Fe, Co, Ni, Al... |
| in-situ sputtering | Ar and O |
| Energy resolution | 10.000 at 700eV |
| Energy range | 80 to 1800 eV |
| Phone | +49 30 8062 14750 |