LEEM-PEEM
LEEM-PEEM
Combined Low-Energy- / Photoemission-Electron-Microscope with aberration correction.
For more details, please contact Stefan Cramm "s.cramm (at) fz-juelich.de".
| Station data | |
|---|---|
| Temperature range | 300-1600 K |
| Pressure Range | 4 E-10 -- 1 E-7 mbar |
| Detector | two-stage MCP (Hamamatsu) |
| Manipulators | 5-Axis Piezo-contolled |
| Sample holder compatibility | special SPECS
samples 9mm |
| Beamline(s) | |
| Spatial resolution LEEM-mode | 2 nm |
| Spatial resolution PEEM-mode | 20 nm |
| base pressure | 4E-10 mbar |
| Preparation chamber | * Sputtering up to 1.5kV * Sample temp. range 300 - 1200 K * pyrometric temp. measurement * LEED * Auger * gas inlets: Ar, O2, user specific * base pressure 1E-10 mbar |
| phone | +49 30 8062 14714 |
Methods
NEXAFS, XMCD, Photoelectron EM, X-ray MicroscopyThis microscope is equipped with a new state-of-the-art aberration corrector minimizing electron-optical imperfections, allowing for higher instrument transmission and simultaneously better spatial resolution. In LEEM-Mode, 2 nm have been demonstrated recently. In combination with soft x-rays (XPEEM), spatially-resolved spectroscopic investigations can be carried out (NEXAFS, XPS) as well as magnetic spectroscopies (XMCD,XMLD). A recently installed extension allows to perform stroboscopic XPEEM experiments for magnetization dynamics.
