LEEM-PEEM

Combined Low-Energy- / Photoemission-Electron-Microscope with aberration correction.

For more details, please contact Stefan Cramm "s.cramm (at) fz-juelich.de".

Electron-optical layout of the SPECS P90 AC LEEMPEEM

Station data
Temperature range	300-1600 K
Pressure Range	4 E-10 -- 1 E-7 mbar
Detector	two-stage MCP (Hamamatsu)
Manipulators	5-Axis Piezo-contolled
Sample holder compatibility	special SPECS samples 9mm
Beamline(s)	UE56-1_SGM
Spatial resolution LEEM-mode	2 nm
Spatial resolution PEEM-mode	20 nm
base pressure	4E-10 mbar
Preparation chamber	* Sputtering up to 1.5kV * Sample temp. range 300 - 1200 K * pyrometric temp. measurement * LEED * Auger * gas inlets: Ar, O2, user specific * base pressure 1E-10 mbar
phone	+49 30 8062 14714

Methods

NEXAFS, XMCD, Photoelectron EM, X-ray Microscopy

This microscope is equipped with a new state-of-the-art aberration corrector minimizing electron-optical imperfections, allowing for higher instrument transmission and simultaneously better spatial resolution. In LEEM-Mode, 2 nm have been demonstrated recently. In combination with soft x-rays (XPEEM), spatially-resolved spectroscopic investigations can be carried out (NEXAFS, XPS) as well as magnetic spectroscopies (XMCD,XMLD). A recently installed extension allows to perform stroboscopic XPEEM experiments for magnetization dynamics.