|Sample holder compatibility||--|
|Max. sample size||150 x 40 x 35 (L x W x H) mm|
|Min. sample size||5 x 5 x 0.5 (L x W x H) mm|
|Sample scan range||-90 to +90 degree|
|Min. angle to normal||2.0 degree|
|Assigned to beamline(s)|
|UE56-2_PGM-2||60 - 1300 eV|
|U125-2_NIM||6(4) - 40 eV|
|KMC-1||Si(111):2 - 12 keV; Si(311): 4 - 12 keV; Si(422): 6 - 12 keV|
Reflectometry - At-wavelength metrology
The reflectometer is a multipurpose instrument to determine the optical properties of samples in transmission or reflection. The reflectivity can be determined at a fixed photon energy as function of the incidence angle or vice versa as function of the energy for a certain incidence angle. The samples can have a size from a few square millimeters to macroscopic optical elements, thus performance measurements on realistic beamline optical components like mirrors, gratings or crystals are possible as well as the investigation of e.g. multilayer samples on Si-wafer substrates.
It is equipped with 3 UHV-compatible goniometers (Huber 408 and 410) and UHV stepper motors (Phytron) for varying the incidence angle at the sample and for positioning the detector in plane or out of plane. The reflection plane is vertical (i.e. in general s-polarisation geometry).
The station is flexible and it can be mounted on dipole or undulator beamlines, and is meant to complement the fixed reflectometer station in the optics hutch in energy ranges which are not accessible at the optics beamline, i.e. in the UV and x-ray range (NIM, DCM).
For more details contact the station scientist(s).