• Grzanna, J.; Notz, T.; Stempel, T.; Lewerenz, H.J.: Nanopore Morphology Development during Current Oscillations at the Si/Electrolyte Contact. ECS Transactions 33 (2011), p. 127-135

10.1149/1.3553164

Abstract:
The development of nanopore morphology at the Si/electrolyte contact is considered during the anodic oxidation of n-type silicon in fluoride containing solutions. The applied morphological model is characterized by stress in silicon and cracks and nanopores in silicon oxide. We present the “Thickness Oscillator Model” in macroscopic and microscopic formulation. For the temporarily resolved macroscopic model, a relation between the integral equation used for calculation of the so-called synchronization states and the Helmholtz differential equation is presented. The nanopore morphology during current oscillations is measured by high resolution scanning electron microscopy and calculated using the microscopic model in the form of a spatio-temporarily resolved two-dimensional cellular automate. Two types of silicon oxide with different nanopore densities are visible which are shown to be the physical origin of the synchronization of the oscillations.