Department Spin and Topology in Quantum Materials
MaxIV
User Access
Standard Access
Spring Cycle. Call opens: September
Approx. beamtime period: March – August
Fall Cycle. Call opens: February
Approx. beamtime period: September – February
Fast Access
Rolling Call: All year
There are three types of Fast Access:
•SE: Scientific Experiment
•SF: Sample Feasibility
•SMS: Standard Measurement Service
Different beamlines offer different options and availability can change over time. Beamlines may only offer some of their experimental set ups or end stations for Fast Access.
Applications are done in DUO, using a Fast Access template, requiring a clear justification of the need for Fast Access.
Requirements for the proposal
After initial registration as a user in DUO, the application typically includes document on the scientific context, preliminary work and experimental plan. The beamlines and end stations can be selected online as well as technical parameters required. Users are encouraged to contact beamline staff prior to submitting proposals. More information available online
Contact person for users from quantum technology
For general questions: MAX IV User office
For respective instrument: please contact the respective instrument scientist
Instruments of MAX IV especially suited for quantum technology research
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Standard Access and |
Standard Access and |
Standard Access and |
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XPS, UPS, NEXAFS, ResPES, ARPES |
XPS, UPS, TEY-XAS, PEY-XAS, TFY-XAS, ARPES, AES, LEED, Thermal desorption spectroscopy , IR, VIS and UV photoluminescence |
LEEM, PEEM, µ-LEED, µ-XPS, µ-APRES, XMCD-PEEM, XMLD-PEEM |
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Spectroscopic studies of electronic properties of surfaces, interfaces, 2D materials and thin films under UHV conditions. Suitable for investigating on-surface reactions, growth processes, adsorption/desorption etc. |
Solids, Solid-molecule interfaces, Nanoscale Functional (e.g. biofunctional, photonic, and catalytic) nanostructures. Time-resolved photoluminescence spectroscopy in solids Pump-probe optical spectroscopy in solids |
Element-selective and magnetic-sensitive spatially resolved imaging of magnetic domains at high spatial resolution (sub – 25nm scale) Suitable for studying sub-25 nm scale magnetoelectronic devices. |
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•Energy range: 43-1600 eV
•Focused beam: 50x20 µm
•Defocused beam: 1x0.5 mm (for sensitive samples)
•Sample cooling: down to 90 K (standard) or 45 K (LHe) or 20 K (LHe, Cu head)
•Sample heating: up to 1400 K (e-beam) or 1600 K (direct heating)
•T-XPS possible up to 800 K
•PES with DA-30 analyzer
•X-ray absorption: fast continuous scanning, TEY, PEY (MCP detector), TFY and PFY (SDD detector)
•Two preparation chambers, fast-load, gas-inlet system, LEED, RGA, sputtering and heating in both chambers, etc.
•Sample transfer to/from offline MAX IV STM setup
•High level of automation
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•Energy range: 4.5 - 1300 eV
•Polarization control: Linear (Horizontal, Vertical, incline); Circular
•X-ray spot size 15 x 15 μm on sample by closing beamline slits
•Nitrogen cooling down to 90 K on sample. LHe cooling down to 50K.
•Resistive and EB heating up to 1000 ˚C; Direct sample heating by sending current through sample
•Dual X-ray tube (Al, Mg Kα) and Helium lamp as off-line light sources
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•Energy range: 30 - 1800 eV
•light is incidence normal to the sample.
•aberration-corrected spectroscopic photoemission and low-energy electron microscope
•X-ray spot size 10x10 μm
•Cooling down to 80 K on sample. LHe in near future. Sample heating up to 1200 C while imaging
•Spatial resolution down to 5 nm (electrons) or 20 nm (photons) . Energy resolution ~60 meV (µ-XPS) and ~150 meV for µ-ARPES, XPEEM.
•Magnetic field: holders for in- and out of plane magnetic fields up to 100 mT
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Standard Access and |
Standard Access and |
Standard Access |
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Nanoprobe XRF, CDI, ptychography, ptycho-tomo, XRF-tomo, circular dichroism imaging, phase contrast imaging. |
Nanoprobe XRF, nanoprobe XRD & WAXS, tomo, X-ray induced beam current imaging, Bragg CDI, Bragg ptychography, circular dichroism imaging, phase contrast. |
In operando PXRD & PDF, in situ XRD & PDF, MICROCT, PDF, phase contrast imaging, PXRD, radiography, scanning XRD, imaging, tomography, total scattering, XRD-CT, XRF, XTM |
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2D or 3D nanoscale imaging (10-100 nm) of chemistry and structure. Measurements entirely in vacuum. |
Nanoscale imaging (15-150 nm) of chemistry, structure, and strain. Measurements done in atmosphere and sample environments up to 1 kg and ~tennis ball size supported. |
Atomic structure, Microstructure (< 1 µm resolution)
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•Energy range: 6 - 15 KeV
•Polarization control:
horizontal and circular •Coherent X-ray spot size:
30-80 nm •fully in vacuum to optimize diffraction and fluorescence signal
•Two fluorescence detectors enable high-resolution chemical mapping and tomography
•In-vacuum pixel detector for forward scattering for ptychography
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•Energy range: 6 - 26 KeV
•Polarization control:
horizontal and circular •Coherent X-ray spot size:
40-160nm •Variety of detectors to allow for WAXS, high resolution nanoXRD, BraggCDI, ptychography, fluorescence mapping, STXM, and others
•User provided sample environments are commonly implemented at the beamline, allowing for flexible and unique operando/in-situ experimentation
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•Energy range: 15 - 35 keV
•Energy resolution: DCM: ∆E/E = 2e-4, MLM: ∆E/E=0.5-1%
•Beam focus & spatial resolution: 7x60 µm2 to 1.1x1.1 mm2
•Photon flux on sample: 1012-1015 ph/s
•Detector and geometry
PXRD: DECTRIS PILATUS3 X 2M CdTe area detector for Debye-Scherrer transmission geometry. 1 element Rayspec SDD in backscattering geometry for XRF. Imaging: Hamamatsu ORCA Lightening sCMOS camera. 'White beam' geometry microscope w. 10 and 20 x magnification - equal to pixel sizes of 550 nm or 275 nm, respectively. |
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Standard Access and |
Standard Access and |
Standard Access and |
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APXPS, XAS (UHV, 1 mbar range, and 1 bar range), XMCD, XMLD, RIXS |
RIXS, XAS, XES, XLD, XMCD, PFY, IPFY |
Laser-pump / X-ray probe THz-pump / X-ray probe Diffraction, WAXS, SAXS, Time-resolved photoluminescence. |
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Spectroscopy in ambient pressure (XPS in mbar regime and XAS in atmospheric pressures). Investigations of solid/gas interfaces in various conditions. Suitable for investigating surface reactions and under operando conditions |
RIXS in solid, liquid and gas samples. Time gating and synchronization with ring electron bunches for efficient background reduction. 1 X 5 um spot on sample supported by ultra-stable manipulator |
Instrument to study structure and dynamics of materials in ultrafast time scales |
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•Energy range: 30-1500 eV
•Polarization control: Linear (Horizontal and vertical) and circular (right and left)
•XPS up to mbar range,
XAS up to 1 bar •Heating depending on sample environment – several hundreds of °C
•XAS with TEY and TFY
•External light sources (solar simulator, UV lamp)
•Surface science preparation tools
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•Energy range: 250-1500 eV
•Focused beam: 1x5 µm
•Polarization control: Linear (Horizontal and vertical) and circular (right and left)
• Temperature control: 15-300K
•XAS: TEY, TFY (MCP detector and photo diode), PFY and IPFY (MCP based DLD detector)
•XMCD and MCD-RIXS: in-plane and out-of-plane fixed magnetic field of 0.3 T
•4-axes and 6-axes sample manipulator
•Load lock with Ar-suitcase
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•Energy range: 2 - 15 keV
•Focused beam: 50 x 80 µm, defocusing is optional, slit down to 10 x 80 µm
•Sample cool/heat: 10 – 500 K
•Semiautomatic data collection and live data display
•Laser pump 266 – 1400 nm, THz pump
•MLM mono (2% bandwidth >2e7 photons/pulse)
•DCM mono (0.04% bandwidth >4e5 photons/pulse)
•In vacuum endstation: GIXS
•In air endstation: Kappa
•Extreme geometry G-chamber.
•Solution scattering set-up
•3 detectors with different pixel size available (172 x 172 µm, 12 x 12 µm, 6 x 6 µm)
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Standard Access and |
Standard and FastAcess (SE, SF) |
Standard Access and |
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STXM branch – soft X-ray nanoprobe techniques: STXM; Ptychography; XRF mapping (under commissioning) CXI branch – soft x-ray microprobe full field techniques: Holography, CDI, XPCS. Open port + internal end station (in preparation) |
Hard X-ray Operando and in-situ X-ray absorption spectroscopy (XANES + EXAFS), cryo-EXFAS, multimodal combination with diffraction, X-ray emission spectroscopy |
ARPES, spin-resolved ARPES |
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SSTXM: 2D Spectromicroscopy & XMCD/XMLD imaging, phase and absorption measurements – all in transmission CXI: imaging in real or reciprocal space, speckle tracking – transmission & reflection |
Atomic structure, Microstructure (< 1 µm resolution) |
High resolution studies of electronic bandstructure for 2D materials and surfaces |
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•Energy range: 275-2500 (CXI 2000) eV
•Polarisation control: linear H/V, inclined, circular (+/-)
•STXM branch: Spot size ~20-100 nm2
•CXI branch: Spot size 20x20 mm2
•STXM branch: Quadrupole Magnetic set up – field strength o to (+-) 415 mT with 360o field rotation.
•Cooling LN2 (under commissioning) and heating (1000K)
•Photomultiplier (PMT), APD, 2D detectors (CCD & sCMOS), Si drift det.
•CXI: detector rotation -5o to +115o , distance 0.50 to >2m
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• Energy range: 4-50 keV
• Si(111) and Si(311) monochromator
• Photon flux on sample: 5*1012 ph/s
• multi-edge scanning
• multimodal combination of XAS with XRD, XRF
• mapping with spot size < 100x100 µm2
• X-ray emission spectrometer for HERFD and XES
• Cryogenic sample environment with x-y-mapping down to 15K
• fluorescence detection for dilute elements with 7-element SDD- and Ge-detectors
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•Energy range 10-220eV (ARPES) + 220-100eV (XPS only)
•Beam size 10µm x 10µm at normal incidence
•Sample temperatures during measurements of 18K to 400K
•Preparation chambers for gas dosing, annealing, LEED, sputtering, effusion cells
•UHV-coupled STM
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