Optics Beamline
Optics Beamline
Publikationen
2024Wen, S.; Huang, Q.; Sokolov, A.; Zhuang, Y.; Lemke, S.; Seliger, T.; Yu, Y.; Viefhaus, J.; Qi, R.; Zhang, Z.; Wang, Z.: High efficiency multilayer coated laminar gratings with high line density for tender X-ray region. , Optics & Laser Technology 168 (2024), p. 109979/1-8
doi: 10.1016/j.optlastec.2023.109979
2023
Abbasirad, N.; Saadeh, Q.; Ciesielski, R.; Gottwald, A.; Philippsen, V.; Makhotkin, I.; Sokolov, A.; Kolbe, M.; Scholze, F.; Soltwisch, V.: Precise optical constant determination in the soft x-ray, EUV, and VUV spectral range. , Proceedings of SPIE 12496 (2023), p. 124963B/1-4
doi: 10.1117/12.2659369
2022
Feng, Y.; Du, L.L.; Huang, Q.; Liu, Z.; Sokolov, A.; Qi, R.; Yang, X.; Zhang, Z.; Wang, Z.: Cr/C lamellar multilayer grating in conical diffraction mounting for beam splitter used in X-ray free-electron lasers. , Optics Letters 47 (2022), p. 1331-1334
doi: 10.1364/ol.449805
Polkovnikov, V.N.; Shaposhnikov, R.A.; Zuev, S.Y.; Svechnikov, M.V.; Sertsu, M.G.; Sokolov, A.; Schäfers, F.; Chkhalo, N.I.: Highly reflective Ru/Y multilayer mirrors for the spectral range of 9-11 nm. , Optics Express 30 (2022), p. 19332-19342
doi: 10.1364/oe.448069
Yu, Y.; Ye, Z.; Jiang, L.; Yao, Q.; Li, S.; Wu, J.; Zhang, J.; Huang, Q.; Xie, C.; Sokolov, A.; Zhou, H.; Huo, T.; Li, W.; Wang, Z.: Laboratory-based reflectometer using line spectra of an RF-induced gas-discharge lamp in 30- to 200-nm wavelength range. , Journal of Astronomical Telescopes, Instruments, and Systems 8 (2022), p. 017002/1-13
doi: 10.1117/1.jatis.8.1.017002
2021
Feng, Y.; Huang, Q.; Zhuang, Y.; Sokolov, A.; Lemke, S.; Qi, R.; Zhang, Z.; Wang, Z.: Mo/Si lamellar multilayer gratings with high efficiency and enhanced resolution for the x-ray region of 1000-1700eV. , Optics Express 29 (2021), p. 13416-13427
doi: 10.1364/OE.422483
Sertsu, M.G.; Sokolov, A.; Chkhalo, N.; Polkovnikov, V.; Salashchenko, N.; Svechnikov, M.; Schäfers, F.: Optical constants of beryllium thin layers determined from Mo/Be multilayers in spectral range 90 to 134 eV. , Optical Engineering 60 (2021), p. 044103/1-8
doi: 10.1117/1.oe.60.4.044103
2020
Vainer, Y.A.; Garakhin, S.A.; Zuev, S.Y.; Nechay, A.N.; Pleshkov, R.S.; Polkovnikov, V.N.; Salashchenko, N.N.; Svechnikov, M.V.; Sertsu, M.G.; Smertin, R.M.; Sokolov, A.; Chkhalo, N.I.; Schäfers, F.: Beryllium-Based Multilayer Mirrors for the Soft X-Ray and Extreme Ultraviolet Wavelength Ranges. , Journal of Surface Investigation 14 (2020), p. 124-134
doi: 10.1134/s1027451020020160
Polkovnikov, V.N.; Salashchenko, N.N.; Svechnikov, M.V.; Chkhalo, N.I.: Beryllium-based multilayer X-ray optics. , Physics Uspekhi / Russian Academy of Sciences = Uspechi fizičeskich nauk 63 (2020), p. 83-95
doi: 10.3367/ufne.2019.05.038623
Yang, Y.; Huang, Q.; Kozhevnikov, I.V.; Liao, Y.; Qi, R.; Sokolov, A.A.; Zhang, Z.; Zhang, Z.; Wang, Z.: Comparative study of single-layer, bilayer, and trilayer mirrors with enhanced x-ray reflectance in 0.5- to 8-keV energy region. , Journal of Astronomical Telescopes, Instruments, and Systems 6 (2020), p. 044001 /1-12
doi: 10.1117/1.JATIS.6.4.044001
Mazuritskiy, M.I.; Lerer, A.M.: Focusing of Long-Wavelength X-Rays by Means of Spherical and Planar Microchannel Plates. , JETP Letters 112 (2020), p. 138-144
doi: 10.1134/s0021364020150072
Garakhin, S.A.; Chkhalo, N.I.; Kas'kov, I.A.; Lopatin, A.Y.; Malyshev, I.V.; Nechay, A.N.; Pestov, A.E.; Polkovnikov, V.N.; Salashchenko, N.N.; Svechnikov, M.V.; Tsybin, N.N.; Zabrodin, I.G.; Zuev, S.Y.: High-resolution laboratory reflectometer for the study of x-ray optical elements in the soft and extreme ultraviolet wavelength ranges. , Review of Scientific Instruments 91 (2020), p. 063103/1-13
doi: 10.1063/1.5144489
Massahi, S.; Christensen, F. E.; Ferreira, D. D. M.; Svendsen, S.; Henriksen, P. L.; Vu, L. M.; Gellert, N. C.; Jegers, A. S.; Shortt, B.; Bavdaz, M.; Ferreira, I.; Collon, M.; Landgraf, B.; Girou, D.; Sokolov, A.; Schoenberger, W.: Investigation of boron carbide and iridium thin films, an enabling technology for future x-ray telescopes. , Applied Optics 59 (2020), p. 10902-10911
doi: 10.1364/AO.409453
Filatova, E.O.; Konashuk, A.S.; Sakhonenkov, S.S.; Gaisin, A.U.; Kolomiiets, N.M.; Afanas'ev, V.V.; Dekkers, H.F.W.: Mechanisms of TiN Effective Workfunction Tuning at Interfaces with HfO2 and SiO2. , The Journal of Physical Chemistry C 124 (2020), p. 15547-15557
doi: 10.1021/acs.jpcc.0c03605
Polkovnikov, V.N.; Garakhin, S.A.; Kvashennikov, D.S.; Malyshev, I.V.; Salashchenko, N.N.; Svechnikov, M.V.; Smertin, R.M.; Chkhalo, N.I.: Multilayer Cr/Sc Mirrors with Improved Reflection for the "Water Transparency Window" Range. , Technical Physics 65 (2020), p. 1809-1813
doi: 10.1134/s1063784220110225
Svechnikov, M.; Chkhalo, N.; Lopatin, A.; Pleshkov, R.; Polkovnikov, V.; Salashchenko, N.; Schäfers, F.; Sertsu, M.G.; Sokolov, A.; Tsybin, N.: Optical constants of sputtered beryllium thin films determined from photoabsorption measurements in the spectral range 20.4–250 eV. , Journal of Synchrotron Radiation 27 (2020), p. 75-82
doi: 10.1107/S1600577519014188
Chkhalo, N.; Polkovnikov, V.; Salashchenko, N.; Svechnikov, M.; Tsybin, N.; Vainer, Y.; Zuev, S.: Reflecting properties of narrowband Si/Al/Sc multilayer mirrors at 58.4 nm. , Optics Letters 45 (2020), p. 4666-4669
doi: 10.1364/ol.400526
La Francesca, E.; Angelucci, M.; Liedl, A.; Spallino, L.; Gonzalez, L.A.; Bellafont, I.; Siewert, F.; Sertsu, M.G.; Sokolov, A.; Schäfers, F.; Cimino, R.: Reflectivity and photoelectron yield from copper in accelerators. , Physical Review Accelerators and Beams 23 (2020), p. 083101/1-15
doi: 10.1103/physrevaccelbeams.23.083101
Pleshkov, R.S.; Zuev, S.Y.; Polkovnikov, V.N.; Salashchenko, N.N.; Svechnikov, M.V.; Chkhalo, N.I.; Jonnard, P.: The Smoothing Effect of Si Layers in Multilayer Be/Al Mirrors for the 17- to 31-nm Range. , Technical Physics 65 (2020), p. 1786-1791
doi: 10.1134/s1063784220110201
Zhuang, Y.; Huang, Q.; Kozhevnikov, I.V.; Feng, J.; Qi, R.; Sokolov, A.; Senf, F.; Zhang, Z.; Wang, Z.: Theoretical analysis and development of high efficiency tender x-ray multilayer coated gratings. , In: Oleg Chubar, Kawal Sawhney [Ed.] : Advances in Computational Methods for X-Ray Optics VBellingham, WA: SPIE, 2020 (Proceedings of SPIE ; 11493). - ISBN 978-1-5106-3793-1, p. 114930R/1-10
doi: 10.1117/12.2567578
Huang, Q.; Kozhevnikov, I.; Sokolov, A.; Zhuang, Y.; Li, T.; Feng, J.; Siewert, F.; Viefhaus, J.; Zhang, Z.; Wang, Z.: Theoretical analysis and optimization of highly efficient multilayer-coated blazed gratings with high fix-focus constant for the tender X-ray region. , Optics Express 28 (2020), p. 821-845
doi: 10.1364/OE.28.000821
2019
Nikolay, C.; Alexey, L.; Andrey, N.; Dmitriy, P.; Alexey, P.; Vladimir, P.; Nikolay, S.; Franz, S.; Mewael, S.; Andrey, S.; Mikhail, S.; Nikolay, T.; Sergey, Z.: Beryllium-Based Multilayer Mirrors and Filters for the Extreme Ultraviolet Range. , Journal of Nanoscience and Nanotechnology 19 (2019), p. 546-553
doi: 10.1166/jnn.2019.16474
Mazuritskiy, M.I.; Lerer, A.M.; Dabagov, S.B.; Marcelli, A.; Hampai, D.; Dziedzic-Kocurek, K.: Focusing Properties of Bent Micro-Channel Plates in the X-Ray Range. , Journal of Surface Investigation 13 (2019), p. 1005-1013
doi: 10.1134/s1027451019060144
Zuev, S.Yu.; Pleshkov, R.S.; Polkovnikov, V.N.; Salashchenko, N.N.; Svechnikov, M.V.; Chkhalo, N.I.; Schäfers, F.; Sertsu, M.; Sokolov, A.: Influence of Beryllium Barrier Layers on the Properties of Mo/Si Multilayer Mirrors. , Technical Physics 64 (2019), p. 1688-1691
doi: 10.1134/S1063784219110318
Smertin, R.M.; Garakhin, S.A.; Zuev, S.Yu.; Nechai, A.N.; Polkovnikov, V.N.; Salashchenko, N.N.; Svechnikov, M.V.; Sertsu, M.G.; Sokolov, A.; Chkhalo, N.I.; Schäfers, F.; Yunin, P.A.: Influence of Thermal Annealing on the Properties of Multilayer Mo/Be Mirrors. , Technical Physics 64 (2019), p. 1692-1697
doi: 10.1134/S1063784219110252
Filatova, E.O.; Sakhonenkov, S.S.; Konashuk, A.S.; Kasatikov, S.A.; Afanas'ev, V.V.: Inhibition of Oxygen Scavenging by TiN at the TiN/SiO2 Interface by Atomic-Layer-Deposited Al2O3 Protective Interlayer. , The Journal of Physical Chemistry C 123 (2019), p. 22335-22344
doi: 10.1021/acs.jpcc.9b05800
Zuyev, S.Yu.; Pariev, D.E.; Pleshkov, R.S.; Polkovnikov, V.N.; Salashchenko, N.N.; Svechnikov, M.V.; Sertsu, M.G.; Sokolov, A.; Chkhalo, N.; Schäfers, F.: Mo/Si Multilayer Mirrors with B4C and Be Barrier Layers. , Journal of Surface Investigation 13 (2019), p. 169-172
doi: 10.1134/S1027451019020216
Mazuritskiy, M.I.; Lerer, A.M.; Kulov, S.K.; Samkanashvili, D.G.: On the Surface Structure of Microchannel Plates and the Excitation of X-Ray Fluorescence in Hollow Microcapillaries. , Journal of Surface Investigation 13 (2019), p. 499-507
doi: 10.1134/S1027451019030297
Sokolov, A.; Huang, Q.; Senf, F.; Feng, J.; Lemke, S.; Alimov, S.; Knedel, J.; Zeschke, T.; Kutz, O.; Seliger, T.; Gwalt, G.; Schäfers, F.; Siewert, F.; Kozhevnikov, I.V.; Qi, R.; Zhang, Z.; Li, W.; Wang, Z.: Optimized highly efficient multilayer-coated blazed gratings for the tender X-ray region. , Optics Express 27 (2019), p. 16833-16846
doi: 10.1364/OE.27.016833
Gubarev, V.; Yakovlev, V.; Sertsu, M.; Yakushev, O.; Krivtsun, V.; Gladush, Y.; Ostanin, I.; Sokolov, A.; Schäfers, F.; Medvedev, V.; Nasibulin, A.: Single-walled carbon nanotube membranes for optical applications in the extreme ultraviolet range. , Carbon 155 (2019), p. 734-739
doi: 10.1016/j.carbon.2019.09.006
Lin, D.; Liu, Z.; Dietrich, K.; Sokolov, A.; Sertsu, M.G.; Zhou, H.; Huo, T.; Kroker, S.; Chen, H.; Qiu, K.; Xu, X.; Schäfers, F.; Liu, Y.; Kley, E.-B.; Hong, Y.: Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask. , Journal of Synchrotron Radiation 26 (2019), p. 1782-1789
doi: 10.1107/S1600577519008245
Polkovnikov, V.N.; Chkhalo, N.I.; Pleshkov, R.S.; Salashchenko, N.N.; Schäfers, F.; Sertsu, M.; Sokolov, A.; Svechnikov, M.V.; Zuev, S.Yu.: Stable high-reflection Be/Mg multilayer mirrors for solar astronomy at 30.4 nm. , Optics Letters 44 (2019), p. 263-266
doi: 10.1364/OL.44.000263
Polkovnikov, V.N.; Chkhalo, N.I.; Meltchakov, E.; Delmotte, F.; Zuev, S.Yu.; Salashchenko, N.N.; Svechnikov, M.V.; Tsybin, N.N.: Stable Multilayer Reflective Coatings for Λ(HeI) = 58.4 nm for the KORTES Solar Telescope. , Technical Physics Letters 45 (2019), p. 85–88
doi: 10.1134/S1063785019020147
2018
Dziarzhytski, S.; Siewert, F.; Sokolov, A.; Gwalt, G.; Seliger, T.; Rübhausen, M.; Weigelt, H.; Brenner, G.: Diffraction gratings metrology and ray-tracing results for an XUV Raman spectrometer at FLASH. , Journal of Synchrotron Radiation 25 (2018), p. 138-144
doi: 10.1107/S1600577517013066
Sokolov, A.; Sertsu, M.; Gaupp, A.; Lüttecke, M.; Schäfers, F.: Efficient high-order suppression system for a metrology beamline. , Journal of Synchrotron Radiation 25 (2018), p. 100-107
doi: 10.1107/S1600577517016800
Siewert, F.; Löchel, B.; Buchheim, J.; Eggenstein, F.; Firsov, A.; Gwalt, G.; Kutz, O.; Lemke, S.; Nelles, B.; Rudolph, I.; Schäfers, F.; Seliger, T.; Senf, F.; Sokolov, A.; Waberski, C.; Wolf, J.; Zeschke, T.; Zizak, I.; Follath, R.; Arnold, T.; Frost, F.; Pietag, F.; Erko, A.: Gratings for synchrotron and FEL beamlines: a project for the manufacture of ultra-precise gratings at Helmholtz Zentrum Berlin. , Journal of Synchrotron Radiation 25 (2018), p. 91-99
doi: 10.1107/S1600577517015600
Svechnikov, M.V.; Chkhalo, N.I.; Gusev, S.A.; Nechay, A.N.; Pariev, D.E.; Pestov, A.E.; Polkovnikov, V.N.; Tatarskiy, D.A.; Salashchenko, N.N.; Schäfers, F.; Sertsu, M.G.; Sokolov, A.; Vainer, Y.A.; Zorina, M.V.: Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography. , Optics Express 26 (2018), p. 33718-33731
doi: 10.1364/OE.26.033718
Majhi, A.; Nayak, M.; Pradhan, P.C.; Filatova, E.O.; Sokolov, A.; Schäfers, F.: Soft X-ray Reflection Spectroscopy for Nano-Scaled Layered Structure Materials. , Scientific Reports 8 (2018), p. 15724/1-9
doi: 10.1038/s41598-018-34076-5
2017
Konashuk, A.; Filatova, E.; Sakhonenkov, S.; Afanas'ev, V.: Effect of deposition technique on chemical bonding and amount of porogen residues in organosilicate glass. , Microelectronic Engineering 178 (2017), p. 209-212
doi: 10.1016/j.mee.2017.05.038
Yin, Z.; Rehanek, J.; Löchel, H.; Braig, C.; Buck, J.; Firsov, A.; Viefhaus, J.; Erko, A.; Techert, S.: Highly efficient soft X-ray spectrometer based on a reflection zone plate for resonant inelastic X-ray scattering measurements. , Optics Express 25 (2017), p. 10984-10996
doi: 10.1364/OE.25.010984
Chkhalo, N.I.; Gusev, S.A.; Nechay, A.N.; Pariev, D.E.; Polkovnikov, V.N.; Salashchenko, N.N.; Schäfers, F.; Sertsu, M.G.; Sokolov, A.; Svechnikov, M.V.; Tatarsky, D.A.: High-reflection Mo/Be/Si multilayers for EUV lithography. , Optics Letters 42 (2017), p. 5070-5073
doi: 10.1364/OL.42.005070
Ghafoor, N.; Birch, J.; Aquila, A.; Gullikson, E.; Schäfers, F.: Impact of B4C on structure and optical performance of Cr/Sc multilayer X-ray mirrors. , Optics Express 25 (2017), p. 18274-18287
doi: 10.1364/OE.25.018274
Eggenstein, F.; Krivenkov, M.; Rudolph, I.; Sertsu, M.G.; Sokolov, A.; Varykhalov, A.; Wolf, J.; Zeschke, Th.; Schäfers, F.: Investigation of HF-plasma-treated soft x-ray optical elements. , In: Lahsen Assoufid ... [Ed.] : Advances in Metrology for X-Ray and EUV Optics VIIBellingham, Washington: SPIE, 2017 (Proceedings of SPIE ; 10385). - ISBN 978-1-51061-227-3, p. 10385-1-7
doi: 10.1117/12.2272967
Braig, C.; Sokolov, A.; Wilks, R.; Kozina, X.; Kunze, T.; Bjeoumikhova, S.; Thiel, M.; Erko, A.; Bär, M.: Polycapillary-boosted instrument performance in the extreme ultraviolet regime for inverse photoemission spectroscopy. , Optics Express 25 (2017), p. 31840-31852
doi: 10.1364/OE.25.031840
Konashuk, A.S.; Filatova, E.O.: Redistribution of valence and conduction band states depending on the method of modification of SiO2 structure. , Physical Chemistry Chemical Physics 19 (2017), p. 26201-26209
doi: 10.1039/c7cp04914e
Mazuritskiy, M.I.; Lerer, A.M.: Spectral and Diffraction Properties of Microchannel Plates in the Long-Wavelength X-Ray Range. , JETP Letters 105 (2017), p. 572-576
doi: 10.1134/S0021364017090120
Mazuritskiy, M. I.; Dabagov, S. B.; Lerer, A. M.; Dziedzic-Kocurek, K.; Sokolov, A.; Coreno, M.; Turchini, S.; D'Elia, A.; Sacchi, M.; Marcelli, A.: Transmission diffractive patterns of large microchannel plates at soft X-ray energies. , Nuclear Instruments & Methods in Physics Research B 402 (2017), p. 282-286
doi: 10.1016/j.nimb.2017.02.075
2016
Manyakin, M.D.; Kurganskii, S.I.; Dubrovskii, O.I.; Chuvenkova, O.A.; Domashevskaya, E.P.; Ryabtsev, S.V.; Ovsyannikov, R.; Turishchev, S.Yu.: A novel approach to the electronic structure and surface composition investigations of tin-oxygen system materials by means of X-ray absorption spectroscopy combined with ab initio calculations. , Computational Materials Science 121 (2016), p. 119-123
doi: 10.1016/j.commatsci.2016.04.034
Sokolov, A.; Bischoff, P.; Eggenstein, F.; Erko, A.; Gaupp, A.; Künstner, S.; Mast, M.; Schmidt, J.-S.; Senf, F.; Siewert, F.; Zeschke, T.; Schäfers, F.: At-wavelength metrology facility for soft X-ray reflection optics. , Review of Scientific Instruments 87 (2016), p. 052005/1-7
doi: 10.1063/1.4950731
Nayak, M.; Pradhan, P.C.; Lodha, G.S.; Sokolov, A.; Schäfers, F.: Corrigendum: Determining Chemically and Spatially Resolved Atomic Profile of Low Contrast Interface Structure with High Resolution. , Scientific Reports 6 (2016), p. 27322/1-7
doi: 10.1038/srep27322
Gaikovich, P.K.; Polkovnikov, V.N.; Salashchenko, N.N.; Chkhalo, N.I.; Schäfers, F.; Sokolov, A.: Effect of roughness, deterministic and random errors in film thickness on the reflecting properties of aperiodic mirrors for the EUV range. , Quantum Electronics 46 (2016), p. 406-413
doi: 10.1070/QEL16037
Nayak, M.; Pradhan, P.C.; Lodha, G.S.; Sokolov, A.; Schäfers, F.: Erratum: Determining Chemically and Spatially resolved Atomic Profile of Low Contrast Interface Structure with High Resolution. , Scientific Reports 6 (2016), p. 31016/1
doi: 10.1038/srep31016
Senf, F.; Bijkerk, F.; Eggenstein, F.; Gwalt, G.; Huang, Q.; Kruijs, R.; Kutz, O.; Lemke, S.; Louis, E.; Mertin, M.; Packe, I.; Rudolph, I.; Schäfers, F.; Siewert, F.; Sokolov, A.; Sturm, J.M.; Waberski, C.; Wang, Z.; Wolf, J.; Zeschke, T.; Erko, A.: Highly efficient blazed grating with multilayer coating for tender X-ray energies. , Optics Express 24 (2016), p. 13220-13230
doi: 10.1364/OE.24.013220
Filatova, E.O.; Konashuk, A.S.; Schäfers, F.; Afanasev, V.V.: Metallization-Induced Oxygen Deficiency of γ-Al2O3 Layers. , The Journal of Physical Chemistry C 120 (2016), p. 8979-8985
doi: 10.1021/acs.jpcc.6b01352
Filatova, E.O.; Konashuk, A.S.; Petrov, Yu.; Ubyivovk, E.; Sokolov, A.A.; Selivanov, A.; Drozd, V.: NEXAFS study of electronic and atomic structure of active layer in Al/indium tin oxide/TiO2 stack during resistive switching. , Science and Technology of Advanced Materials 17 (2016), p. 274-284
doi: 10.1080/14686996.2016.1182851
Opitz, A.; Wilke, A.; Amsalem, P.; Oehzelt, M.; Blum, R.-P.; Rabe, J.P.; Mizokuro, T.; Hörmann, U.; Hansson, R.; Moons, E.; Koch, N.: Organic heterojunctions: Contact induced molecular reorientation, interface states, and charge redistribution. , Scientific Reports 6 (2016), p. 21291/1-9
doi: 10.1038/srep21291
Mantouvalou, I.; Witte, K.; Martyanov, W.; Jonas, A.; Groetzsch, D.; Streeck, C.; Löchel, H.; Rudolph, I.; Erko, A.; Stiel, H.; Kanngiesser, B.: Single shot near edge x-ray absorption fine structure spectroscopy in the laboratory. , Applied Physics Letters 108 (2016), p. 201106/1-4
doi: 10.1063/1.4951000
Eggenstein, F.; Bischoff, P.; Schäfers, F.; Schroeter, T.; Senf, F.; Sokolov, A.; Zeschke, T.; Erko, A.: Survey and adjustment methods applied on an 11 axes high performance reflectometer for synchrotron radiation. , AIP Conference Proceedings 1741 (2016), p. 030025/1-4
doi: 10.1063/1.4952848
Schäfers, F.; Sokolov, A.: The At-Wavelength Metrology Facility at BESSY-II. , Journal of Large Scale Research Facilities JLSRF 2 (2016), p. A-50
doi: 10.17815/jlsrf-2-72
Schäfers, F.; Bischoff, P.; Eggenstein, F.; Erko, A.; Gaupp, A.; Künstner, S.; Mast, M.; Schmidt, J.-S.; Senf, F.; Siewert, F.; Sokolov, A.; Zeschke, T.: The at-wavelength metrology facility for UV- and XUV-reflection and diffraction optics at BESSY-II. , Journal of Synchrotron Radiation 23 (2016), p. 66-77
doi: 10.1107/S1600577515020615
2015
Peisert, H.; Uihlein, J.; Petraki, F.; Chassé, T.: Charge transfer between transition metal phthalocyanines and metal substrates: The role of the transition metal. , Journal of Electron Spectroscopy and Related Phenomena 204 (2015), p. 49-60
doi: 10.1016/j.elspec.2015.01.005
Ciccullo, F.; Savu, S.-A.; Gerbi, A.; Bauer, M.; Ovsyannikov, R.; Cassinese, A.; Chassé, T.; Casu, M.B.: Chemisorption, morphology, and structure of a n-type perylene diimide derivative at the interface with gold: influence on devices from thin films to single molecules. , Chemistry - A European Journal 21 (2015), p. 3766-71
doi: 10.1002/chem.201404901
Kozhevnikov, I.V.; Filatova, E.O.; Sokolov, A.A.; Konashuk, A.S.; Siewert, F.; Störmer, M.; Gaudin, J.; Keitel, B.; Samoylova, L.; Sinn, H.: Comparative study of the X-ray reflectivity and in-depth profile of a-C, B4C and Ni coatings at 0.1–2 keV. , Journal of Synchrotron Radiation 22 (2015), p. 1-6
doi: 10.1107/S1600577515000430
Nayak, M.; Pradhan, P.C.; Lodha, G.S.; Sokolov, A.; Schäfers, F.: Determining Chemically and Spatially Resolved Atomic Profile of Low Contrast Interface Structure with High Resolution. , Scientific Reports 5 (2015), p. 8618/1-7
doi: 10.1038/srep08618
Uihlein, Johannes: Einfluss von Graphen auf die Wechselwirkung zwischen Phthalocyaninen und Substrat. , Tübingen, 2015
Uihlein, J.; Polek, M.; Glaser, M.; Adler, H.; Ovsyannikov, R.; Bauer, M.; Ivanovic, M.; Preobrajenski, A.B.; Generalov, A.V.; Chasse, T.; Peisert, H.: Influence of Graphene on Charge Transfer between CoPc and Metals: The Role of Graphene-Substrate Coupling. , The Journal of Physical Chemistry C 119 (2015), p. 15240-15247
doi: 10.1021/acs.jpcc.5b02912
Adler, H.; Paszkiewicz, M.; Uihlein, J.; Polek, M.; Ovsyannikov, R.; Basova, T.V.; Chasse, T.; Peisert, H.: Interface Properties of VOPc on Ni(111) and Graphene/Ni(111): Orientation-Dependent Charge Transfer. , The Journal of Physical Chemistry C 119 (2015), p. 8755-8762
doi: 10.1021/acs.jpcc.5b01485
Dugan, G.F.; Sonnad, K.G.; Cimino, R.; Ishibashi, T.; Schäfers, F.: Measurements of x-ray scattering from accelerator vacuum chamber surfaces, and comparison with an analytical model. , Physical Review Special Topics - Accelerators and Beams 18 (2015), p. 040704/1-20
doi: 10.1103/PhysRevSTAB.18.040704
Cimino, R.; Baglin, V.; Schäfers, F.: Potential remedies against the high Synchrotron Radiation induced heat load for future highest energy proton circular colliders. , Physical Review Letters 115 (2015), p. 264804/1-5
doi: 10.1103/PhysRevLett.115.264804
Winkler, S.; Amsalem, P.; Frisch, J.; Oehzelt, M.; Heimel, G.; Koch, N.: Probing the energy levels in hole-doped molecular semiconductors. , Materials Horizons 2 (2015), p. 427-433
doi: 10.1039/c5mh00023h
Hafner, A.; Anklamm, L.; Firsov, A.; Firsov, A.; Löchel, H.; Sokolov, A.; Gubzokov, R.; Erko, A.: Reflection zone plate wavelength-dispersive spectrometer for ultra-light elements measurements. , Optics Express 23 (2015), p. 29476-29483
doi: 10.1364/OE.23.029476
2014
Höpfner, Britta: Diffusion und Phasenbildung bei der Abscheidung von Chalkopyritabsorbern auf transparenten oxidischen Leitern. , Freie Universität Berlin, 2014
Uihlein, J.; Peisert, H.; Adler, H.; Glaser, M.; Polek, M.; Ovsyannikov, R.; Bauer, M.; Chasse, T.: Strong Interaction of MnPc on Ni(111): Influence of Graphene Buffer Layer. , The Journal of Physical Chemistry C 118 (2014), p. 28671-28678
doi: 10.1021/jp5095036
2013
Heimel, G.; Duhm, S.; Salzmann, I.; Gerlach, A.; Strozecka, A.; Niederhausen, J.; Bürker, C.; Hosokai, T.; Fernandez-Torrente, I.; Schulze, G.; Winkler, S.; Wilke, A.; Schlesinger, R.; Frisch, J.; Bröker, B.; Vollmer, A.; Detlefs, B.; Pflaum, J.; Kera, S.; Franke, K.J.; Ueno, N.; Pascual, J.I.; Schreiber, F.; Koch, N.: Charged and metallic molecular monolayers through surface-induced aromatic stabilization. , Nature Chemistry 5 (2013), p. 187-194
doi: 10.1038/NCHEM.1572
Latteyer, Florian: Einflüsse auf die molekulare Orientierung von Phthalocyaninen in dünnen SchichtenInfluences on the molecular orientation of phthalocyanines in thin films. , Tübingen, Eberhard Karls Universität, Diss., 2013
Köppen, Martin: Energievariierte Photoemissionsstudien an berylliumhaltigen Oberflächen für die Fusion. , München, Technische Universität München, Diss., 2013
Broch, Katharina: Interplay of Ordering Behavior and Optical Properties in Organic Semiconductor Blends. , Tübingen, Eberhard Karls Universität, Diss., 2013
2012
Salzmann, I.; Moser, A.; Oehzelt, M.; Breuer, T.; Feng, X.; Juang, Z.-Y.; Nabok, D.; Della Valle, R.G.; Duhm, S.; Heimel, G.; Brillante, A.; Venuti, E.; Bilotti, I.; Christodoulou, C.; Frisch, J.; Puschnig, P.; Draxl, C.; Witte, G.; Müllen, K.; Koch, N.: Epitaxial Growth of pi-Stacked Perfluoropentacene on Graphene-Coated Quartz. , ACS Nano 6 (2012), p. 10874-10883
doi: 10.1021/nn3042607
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