Köble, Ch. ; Greiner, D. ; Klaer, J. ; Klenk, R. ; Meeder, A. ; Ruske, F.: DC reactive sputtering of aluminium doped zinc oxide films for solar modules controlled by target voltage. Thin Solid Films 518 (2009), p. 1204-1207
10.1016/j.tsf.2009.05.055
Abstract:
Reactive sputtering is an option to further reduce costs associated with the deposition of the transparent front contact for chalcopyrite-based solar modules. In view of the difficulties reported in scaling-up reactive ZnO sputtering we have chosen a simple and robust approach. It comprises a dual magnetron operated in DC/DC mode, a constant oxygen flow and a control by target voltage. After process optimisation, the optical and electrical properties of the reactively sputtered films are comparable to those of reference films (RF-sputtered from ceramic targets). Likewise, the efficiency of monolithically integrated CuInS2-based module test structures is not affected by the modified ZnO process.